SCHEMBL17300308

SCHEMBL17300308

CCCC1OC(=O)CC1(CCC)OC(=O)C(C)CC

nearest known ligand 0.33

Predicted protein targets (top 3)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 1/20 0.32
KAT2A Q92830 2/20 0.30
PRKCA P17252 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17300302 0.91 HMGCR (0.31) HMGCR
SCHEMBL17300295 0.91 HMGCR (0.33) HMGCRKAT2APRKCA
SCHEMBL17300294 0.85 HMGCR (0.33) HMGCR
SCHEMBL17300309 0.85 HMGCR (0.33) HMGCRKAT2APRKCA
SCHEMBL17300316 0.84 HMGCR (0.31) HMGCR
SCHEMBL17300307 0.81 HMGCR (0.33) HMGCRKAT2APRKCA
SCHEMBL17300304 0.81 HMGCR (0.32) HMGCR
SCHEMBL17300303 0.78
SCHEMBL17300328 0.76 HMGCR (0.34) HMGCR
SCHEMBL17300312 0.76 HMGCR (0.32) HMGCR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20150346600-A1 RESIST COMPOSITION AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2015-12-03 US disclosed