⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14878938 | 0.86 | — | — | |
| SCHEMBL98514 | 0.75 | — | — | |
| SCHEMBL12341123 | 0.70 | — | — | |
| SCHEMBL9926076 | 0.68 | — | — | |
| SCHEMBL21567725 | 0.57 | — | — | |
| SCHEMBL25701247 | 0.55 | — | — | |
| SCHEMBL18872442 | 0.54 | MAPT (0.31) | — | |
| SCHEMBL12977386 | 0.54 | — | — | |
| SCHEMBL13057396 | 0.54 | MAPT (0.31) | — | |
| SCHEMBL18022193 | 0.54 | MAPT (0.31) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20120282551-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN AND POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-11-08 | — | — | US | disclosed |
| US-20120270155-A1 | COMPOUND, POLYMERIC COMPOUND, ACID GENERATOR, RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-10-25 | — | — | US | disclosed |
| US-20120264058-A1 | RESIST COMPOSITION FOR NEGATIVE DEVELOPMENT AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-10-18 | — | — | US | disclosed |
| US-20120251951-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-10-04 | — | — | US | disclosed |
| US-20120214101-A1 | RESIST COMPOSITION AND METHOD OF FORMING RESIST PATTERN | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-08-23 | — | — | US | disclosed |
| US-8192915-B2 | Positive resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-06-05 | — | — | US | disclosed |
| US-8124313-B2 | Resist composition, method of forming resist pattern, novel compound, and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2012-02-28 | — | — | US | disclosed |
| US-20110117499-A1 | POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN USING THE SAME, AND FLUORINE-CONTAINING POLYMERIC COMPOUND | TOKYO OHKA KOGYO CO., LTD. (JP) | 2011-05-19 | — | — | US | disclosed |
| US-20100196820-A1 | Resist composition, method of forming resist pattern, novel compound and acid generator | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-05 | — | — | US | disclosed |
| US-20100121077-A1 | RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, NOVEL COMPOUND, AND ACID GENERATOR | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-05-13 | — | — | US | disclosed |
| US-20100062369-A1 | Positive resist composition, method of forming resist pattern, and polymeric compound | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-03-11 | — | — | US | disclosed |