SCHEMBL173220

SCHEMBL173220

[SiH3]Nc1ccccc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28442395 0.97
Nitrous Acid SCHEMBL28464261 0.84 TSHR (0.42)
Nitrous Acid SCHEMBL28464259 0.84 TSHR (0.42)
SCHEMBL30806211 0.73
SCHEMBL19298582 0.71 TSHR (1.00)
Benzene SCHEMBL17977991 0.71 TSHR (1.00)
SCHEMBL385175 0.71
SCHEMBL4454 0.71
SCHEMBL3008675 0.71
SCHEMBL10653964 0.71 TDP1 (0.55)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 944 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4683434-A1 INSULATION FILM AND PRINTED CIRCUIT BOARD COMPRISING SAME LG Chem, Ltd. (KR) 2026-01-21 EP claimed
WO-2025121410-A1 RESIN COMPOSITION AND SEMICONDUCTOR DEVICE パナソニックIPマネジメント株式会社 2025-06-12 WO claimed
WO-2025110104-A1 RESIN COMPOSITION AND SEMICONDUCTOR DEVICE パナソニックIPマネジメント株式会社 2025-05-30 WO claimed
WO-2025110106-A1 RESIN COMPOSITION AND SEMICONDUCTOR DEVICE パナソニックIPマネジメント株式会社 2025-05-30 WO claimed
CN-116875053-B Resin composition and application thereof 常熟生益科技有限公司 2025-05-16 CN claimed
US-20250108582-A1 RESIN COMPOSITION, PREPREG, FILM WITH RESIN, SHEET OF METAL FOIL WITH RESIN, METAL-CLAD LAMINATE, AND PRINTED WIRING BOARD PANASONIC INTELLECTUAL PROPERTY MANAGEMENT CO., LTD. (JP) 2025-04-03 US claimed
CN-119570475-A Silane modified composite electrochromic material and preparation method thereof 安徽科技学院 2025-03-07 CN claimed
CN-119490642-A Phase-change temperature-control polyurethane material and preparation method thereof 南通通易航天科技股份有限公司 2025-02-21 CN claimed
CN-118841556-B Silicon-based composite material containing organic flexible coating layer and preparation method thereof 北京壹金新能源科技有限公司 2024-11-26 CN claimed
CN-118931420-A Silicon dioxide composite slurry and preparation method and application thereof 联瑞新材(连云港)有限公司 2024-11-12 CN claimed
WO-2001049628-A1 CATALYTICALLY POLYMERIZED FIBER-REINFORCED COMPOSITES OWENS CORNING (US) 2001-07-12 WO claimed
CN-1064062-C Epoxy resin composition used for formation and press molt articles of high voltage apparatus using same and preparation of same MITSUBISHI ELECTRIC CORP (JP) 2001-04-04 CN claimed
US-5939472-A COMPRISING EPOXY RESIN, ACID ANHYDRIDE, CURING ACCELERATOR,COUPLING AGENT AND FILLER; USED FOR APPARATUS FOR HIGH VOLTAGE SUCH AS TRANSFORMER, MOTOR, GAS INSULATED APPARATUS MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1999-08-17 US claimed
US-5919567-A Magnetic head MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1999-07-06 US claimed
US-5880179-A MOLDINGS OF EPOXY RESINS WITH HEAT RESISTANCE MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1999-03-09 US claimed
US-5874617-A REACTING AN ACID FLUORIDE WITH AN N-SILYANILINE IN THE PRESENCE OF A BASIC COMPOUND; EFFICIENCY; VOLATILE BY-PRODUCT REMOVED BY VACUUM DISTILLATION; NO FILTERING STEP REQUIRED SHIN-ETSU CHEMICAL CO., LTD. (JP) 1999-02-23 US claimed
US-5662776-A EPOXY BINDERS WITH PHENYLAMINOSILANE COUPLERS FOR NONWOVEN FABRICS SHIN-KOBE ELECTRIC MACHINERY CO. (JP) 1997-09-02 US claimed
CN-1110977-A Epoxy resin composition used for formation and press molt articles of high voltage apparatus using same and preparation of same MITSUBISHI ELECTRIC CORP (JP) 1995-11-01 CN claimed
EP-0673957-A2 Epoxy resin moulding composition MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 1995-09-27 EP claimed
US-4786558-A Composite film and antistatic composite film comprising a swellable inorganic silicate TORAY INDUSTRIES, LTD. (JP) 1988-11-22 US claimed