⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL4038153 | 0.79 | DPP4 (0.32) | — | |
| SCHEMBL3224780 | 0.78 | — | — | |
| SCHEMBL17468331 | 0.78 | — | — | |
| SCHEMBL17517759 | 0.75 | — | — | |
| SCHEMBL2573711 | 0.71 | GRIN2D (0.31) | — | |
| SCHEMBL5607828 | 0.68 | GRIN2D (0.34) | — | |
| SCHEMBL20024141 | 0.67 | — | — | |
| SCHEMBL29751151 | 0.67 | — | — | |
| SCHEMBL14932913 | 0.67 | — | — | |
| SCHEMBL19766528 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1443363-B1 | Photoresist composition | DAICEL CHEM (JP) | 2013-07-10 | — | — | EP | disclosed |
| EP-0999474-B1 | Photoresist resin composition and method for forming a pattern | DAICEL CHEM (JP) | 2011-11-23 | — | — | EP | disclosed |
| EP-1443363-A2 | Compounds for photoresist and resin composition for photoresist | Daicel Chemical Industries, Ltd. (JP) | 2004-08-04 | — | — | EP | disclosed |
| US-6391520-B1 | ADAMANTANE COMPOUND OR POLYMER AND PHOTOACID GENERATORS; ETCHING RESISTANCE; SOLUBILIZABLE BY IRRADIATION WITH LIGHT; MINUTE PATTERNS | DAICEL CHEMICAL INDUSTRIES, LTD. (JP) | 2002-05-21 | — | — | US | disclosed |
| EP-0999474-A1 | COMPOUNDS FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST | Daicel Chemical Industries, Ltd. (JP) | 2000-05-10 | — | — | EP | disclosed |