SCHEMBL17345035

SCHEMBL17345035

Oc1cccc(C(C(F)(F)F)(C(F)(F)F)C(F)(F)F)c1

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.48
CYP3A4 P08684 3/20 0.48
LMNA P02545 2/20 0.48
CA12 O43570 2/20 0.48
CA2 P00918 2/20 0.48
CA9 Q16790 2/20 0.48
CA14 Q9ULX7 2/20 0.48
CA5A P35218 1/20 0.48
HSD17B10 Q99714 1/20 0.48
CA5B Q9Y2D0 1/20 0.48
MEN1 O00255 1/20 0.42
NPC1 O15118 1/20 0.42
MAPT P10636 1/20 0.42
RAB9A P51151 1/20 0.42
KMT2A Q03164 1/20 0.42
P2RX1 P51575 1/20 0.41
TSHR P16473 2/20 0.40
MAPK1 P28482 1/20 0.40
KIF11 P52732 1/20 0.40
HSD17B1 P14061 3/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL30912776 0.82 ESR1 (0.54) ALDH1A1CYP3A4LMNACA12CA2
SCHEMBL30887991 0.82 CA12 (0.48) ALDH1A1CYP3A4LMNACA12CA2
SCHEMBL30235748 0.82 ESR1 (0.54) ALDH1A1CYP3A4LMNACA12CA2
SCHEMBL842514 0.82 CA12 (0.48) ALDH1A1CYP3A4LMNACA12CA2
SCHEMBL544972 0.82 ESR1 (0.54) ALDH1A1CYP3A4LMNACA12CA2
SCHEMBL29438909 0.81 TSHR (0.54) ALDH1A1CYP3A4LMNACA12CA2
SCHEMBL40389 0.81 TSHR (0.54) ALDH1A1CYP3A4LMNACA12CA2
SCHEMBL4757329 0.80 HSD17B10 (0.46) ALDH1A1CYP3A4LMNACA12CA2
SCHEMBL8724379 0.79 TSHR (0.52) ALDH1A1CYP3A4LMNACA12CA2
Hydrochloric Acid SCHEMBL30994527 0.79 TSHR (0.52) ALDH1A1CYP3A4LMNACA12CA2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20170293227-A1 COATING LIQUID FOR RESIST PATTERN COATING NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-10-12 US disclosed
US-9746768-B2 Resist overlayer film forming composition for lithography and method for producing semiconductor device using the same NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-08-29 US disclosed
US-20150362835-A1 RESIST OVERLAYER FILM FORMING COMPOSITION FOR LITHOGRAPHY AND METHOD FOR PRODUCING SEMICONDUCTOR DEVICE USING THE SAME NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2015-12-17 US disclosed