SCHEMBL17358331

SCHEMBL17358331

CCC(C)(C)C(=O)OCC1(F)CC(F)(F)C(F)(F)C(F)(F)C1

nearest known ligand 0.32

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
HMGCR P04035 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14747361 0.77
SCHEMBL13103089 0.76 CYP4F2 (0.33) HMGCR
SCHEMBL18021935 0.72
SCHEMBL12396506 0.71
SCHEMBL9924502 0.70 CYP4F2 (0.31) HMGCR
SCHEMBL13842935 0.69
SCHEMBL13296226 0.68 CYP4F2 (0.39) HMGCR
SCHEMBL26081337 0.68
SCHEMBL18253355 0.68 HMGCR (0.36) HMGCR
SCHEMBL47403 0.68 CYP4F2 (0.32) HMGCR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9612535-B2 Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device FUJIFILM CORPORATION (JP) 2017-04-04 US disclosed
US-20150370170-A1 PATTERN FORMING METHOD, ELECTRON BEAM- OR EXTREME ULTRAVIOLET-SENSITIVE RESIN COMPOSITION, RESIST FILM USING THE SAME, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2015-12-24 US disclosed