Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | RECQL | P46063 | 3/20 | 0.63 |
| ▸ | THRB | P10828 | 1/20 | 0.63 |
| ▸ | MEN1 | O00255 | 10/20 | 0.50 |
| ▸ | KMT2A | Q03164 | 10/20 | 0.50 |
| ▸ | MAPT | P10636 | 10/20 | 0.50 |
| ▸ | RAB9A | P51151 | 7/20 | 0.50 |
| ▸ | LMNA | P02545 | 6/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 5/20 | 0.50 |
| ▸ | HTT | P42858 | 4/20 | 0.50 |
| ▸ | NPC1 | O15118 | 4/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.50 |
| ▸ | ALDH1A1 | P00352 | 3/20 | 0.49 |
| ▸ | TSHR | P16473 | 3/20 | 0.48 |
| ▸ | TP53 | P04637 | 2/20 | 0.48 |
| ▸ | CRHBP | P24387 | 1/20 | 0.48 |
| ▸ | CRHR2 | Q13324 | 1/20 | 0.48 |
| ▸ | HSD17B10 | Q99714 | 1/20 | 0.48 |
| ▸ | HPGD | P15428 | 1/20 | 0.48 |
| ▸ | NFKB1 | P19838 | 1/20 | 0.48 |
| ▸ | NFKB2 | Q00653 | 1/20 | 0.48 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL10761074 | 0.86 | RECQL (0.60) | RECQLTHRBMEN1KMT2AMAPT | |
| SCHEMBL10761079 | 0.86 | RECQL (0.60) | RECQLTHRBMEN1KMT2AMAPT | |
| SCHEMBL6127720 | 0.81 | RECQL (0.55) | RECQLTHRBMEN1KMT2AMAPT | |
| SCHEMBL6124076 | 0.80 | RECQL (0.55) | RECQLTHRBMEN1KMT2AMAPT | |
| SCHEMBL21023357 | 0.76 | MEN1 (0.66) | RECQLTHRBMEN1KMT2AMAPT | |
| SCHEMBL31544600 | 0.76 | RECQL (0.69) | RECQLTHRBMEN1KMT2AMAPT | |
| SCHEMBL28421765 | 0.76 | RECQL (0.64) | RECQLTHRBMEN1KMT2AMAPT | |
| SCHEMBL686569 | 0.75 | RECQL (0.77) | RECQLTHRBMEN1KMT2AMAPT | |
| SCHEMBL16745549 | 0.74 | SMN1; SMN2 (0.50) | RECQLTHRBMEN1KMT2AMAPT | |
| SCHEMBL14159012 | 0.74 | RECQL (0.48) | RECQLTHRBMEN1KMT2AMAPT |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20230213858-A1 | MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-06 | — | — | US | disclosed |
| US-20230213858-A1 | MANUFACTURING METHOD FOR CURED SUBSTANCE, MANUFACTURING METHOD FOR LAMINATE, AND MANUFACTURING METHOD FOR SEMICONDUCTOR DEVICE | FUJIFILM CORPORATION (JP) | 2023-07-06 | — | — | US | disclosed |
| US-9929376-B2 | Laminate, kit for manufacturing organic semiconductor, and resist composition for manufacturing organic semiconductor | FUJIFILM CORPORATION (JP) | 2018-03-27 | — | — | US | disclosed |
| US-9929376-B2 | Laminate, kit for manufacturing organic semiconductor, and resist composition for manufacturing organic semiconductor | FUJIFILM CORPORATION (JP) | 2018-03-27 | — | — | US | disclosed |
| US-9746771-B2 | Laminate body | FUJIFILM CORPORATION (JP) | 2017-08-29 | — | — | US | disclosed |
| US-9746771-B2 | Laminate body | FUJIFILM CORPORATION (JP) | 2017-08-29 | — | — | US | disclosed |
| US-9601706-B2 | Resin composition for forming protective film, protective film, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| US-9601706-B2 | Resin composition for forming protective film, protective film, pattern forming method, method for manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-03-21 | — | — | US | disclosed |
| US-20160240816-A1 | LAMINATE, KIT FOR MANUFACTURING ORGANIC SEMICONDUCTOR, AND RESIST COMPOSITION FOR MANUFACTURING ORGANIC SEMICONDUCTOR | FUJIFILM CORPORATION (JP) | 2016-08-18 | — | — | US | disclosed |
| US-20160240816-A1 | LAMINATE, KIT FOR MANUFACTURING ORGANIC SEMICONDUCTOR, AND RESIST COMPOSITION FOR MANUFACTURING ORGANIC SEMICONDUCTOR | FUJIFILM CORPORATION (JP) | 2016-08-18 | — | — | US | disclosed |
| US-20160170303-A1 | LAMINATE BODY | FUJIFILM CORPORATION (JP) | 2016-06-16 | — | — | US | disclosed |
| US-20160170303-A1 | LAMINATE BODY | FUJIFILM CORPORATION (JP) | 2016-06-16 | — | — | US | disclosed |
| US-9223211-B2 | Photosensitive resin compositions, processes for preparing cured films, the resulting cured films, organic EL display devices and liquid crystal display devices | FUJIFILM CORPORATION (JP) | 2015-12-29 | — | — | US | disclosed |
| US-20150221881-A1 | RESIN COMPOSITION FOR FORMING PROTECTIVE FILM, PROTECTIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-08-06 | — | — | US | disclosed |
| US-20150221881-A1 | RESIN COMPOSITION FOR FORMING PROTECTIVE FILM, PROTECTIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2015-08-06 | — | — | US | disclosed |
| US-8628907-B2 | Positive photosensitive resin composition, method for forming cured film, cured film, organic el display device and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2014-01-14 | — | — | US | disclosed |
| US-8628907-B2 | Positive photosensitive resin composition, method for forming cured film, cured film, organic el display device and liquid crystal display device | FUJIFILM CORPORATION (JP) | 2014-01-14 | — | — | US | disclosed |
| US-20120107563-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN, MEMS STRUCTURE, METHOD FOR PRODUCING THE STRUCTURE, METHOD FOR DRY ETCHING, METHOD FOR WET ETCHING, MEMS SHUTTER DEVICE, AND IMAGE DISPLAY APPARATUS | FUJIFILM CORPORATION (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20120107563-A1 | PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR PRODUCING PATTERN, MEMS STRUCTURE, METHOD FOR PRODUCING THE STRUCTURE, METHOD FOR DRY ETCHING, METHOD FOR WET ETCHING, MEMS SHUTTER DEVICE, AND IMAGE DISPLAY APPARATUS | FUJIFILM CORPORATION (JP) | 2012-05-03 | — | — | US | disclosed |
| US-20120045616-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE | FUJIFILM CORPORATION (JP) | 2012-02-23 | — | — | US | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20120045616-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE AND LIQUID CRYSTAL DISPLAY DEVICE | PELP1, EED, ARCN1 | RECQL 556/4885THRB 3849/4885MEN1 4568/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.