⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL788128 | 0.71 | — | — | |
| SCHEMBL787980 | 0.71 | — | — | |
| SCHEMBL9766334 | 0.67 | — | — | |
| SCHEMBL432237 | 0.67 | — | — | |
| SCHEMBL4278687 | 0.67 | — | — | |
| SCHEMBL3916410 | 0.64 | — | — | |
| SCHEMBL3912221 | 0.64 | — | — | |
| SCHEMBL3953298 | 0.59 | — | — | |
| SCHEMBL29069966 | 0.59 | — | — | |
| SCHEMBL25283357 | 0.56 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 188 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4748968-A1 | METHOD FOR FORMING THIN FILM USING TWO TYPES OF SILICON PRECURSOR COMPOUNDS | Hansol Chemical Co., Ltd (KR) | 2026-05-27 | — | — | EP | claimed |
| US-12635431-B2 | High aspect ratio carbon layer etch with improved throughput and process window | TOKYO ELECTRON LIMITED (JP) | 2026-05-19 | — | — | US | claimed |
| EP-4667616-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | Hansol Chemical Co., Ltd (KR) | 2025-12-24 | — | — | EP | claimed |
| US-20250369114-A1 | METHOD FOR THE FORMATION OF THIN FILMS USING TWO TYPES OF SILICON PRECURSOR | HANSOL CHEMICAL CO LTD (KR) | 2025-12-04 | — | — | US | claimed |
| US-20250232981-A1 | HIGH ASPECT RATIO CARBON LAYER ETCH WITH IMPROVED THROUGHPUT AND PROCESS WINDOW | TOKYO ELECTRON LIMITED (JP) | 2025-07-17 | — | — | US | claimed |
| EP-3516088-B1 | A METHOD OF FORMING A SILICON-CONTAINING FILM ON A SUBSTRATE | NATA SEMICONDUCTOR MAT CO LTD (CN) | 2025-02-26 | — | — | EP | claimed |
| US-20250038003-A1 | LOW TEMPERATURE MOLYBDENUM DEPOSITION ASSISTED BY SILICON-CONTAINING REACTANTS | LAM RESEARCH CORPORATION (US) | 2025-01-30 | — | — | US | claimed |
| CN-118685753-A | Method for forming silicon nitride and system for performing the same | ASM IP私人控股有限公司 | 2024-09-24 | — | — | CN | claimed |
| CN-118402040-A | Low temperature molybdenum deposition assisted by silicon-containing reactants | 朗姆研究公司 | 2024-07-26 | — | — | CN | claimed |
| US-20240222467-A1 | METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2024-07-04 | — | — | US | claimed |
| US-7939447-B2 | Inhibitors for selective deposition of silicon containing films | ASM AMERICA, INC. (US) | 2011-05-10 | — | — | US | claimed |
| US-7772097-B2 | Methods of selectively depositing silicon-containing films | ASM AMERICA, INC. (US) | 2010-08-10 | — | — | US | claimed |
| WO-2009061599-A1 | METHODS OF SELECTIVELY DEPOSITING SILICON-CONTAINING FILMS | ASM AMERICA, INC. (US) | 2009-05-14 | — | — | WO | claimed |
| US-20090117717-A1 | METHODS OF SELECTIVELY DEPOSITING SILICON-CONTAINING FILMS | ASM AMERICA, INC. (US) | 2009-05-07 | — | — | US | claimed |
| US-20090111246-A1 | INHIBITORS FOR SELECTIVE DEPOSITION OF SILICON CONTAINING FILMS | ASM AMERICA, INC. (US) | 2009-04-30 | — | — | US | claimed |
| EP-2030227-A2 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM America, Inc. (US) | 2009-03-04 | — | — | EP | claimed |
| US-20080241748-A1 | Etch-resistant disilane and saturated hydrocarbon bridged silicon-containing polymers, method of making the same, and method of using the same | CHEIL INDUSTRIES, INC. (KR) | 2008-10-02 | — | — | US | claimed |
| US-20080095691-A1 | Apparatus and Process for Preparing Silanes | DEGUSSA GMBH (GE) | 2008-04-24 | — | — | US | claimed |
| US-20080026149-A1 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM AMERICA, INC. (US) | 2008-01-31 | — | — | US | claimed |
| WO-2007140375-A2 | METHODS AND SYSTEMS FOR SELECTIVELY DEPOSITING SI-CONTAINING FILMS USING CHLOROPOLYSILANES | ASM AMERICA, INC. (US) | 2007-12-06 | — | — | WO | claimed |