SCHEMBL17434656

SCHEMBL17434656

CNC(=O)[C@@](C)(C(=O)NO)N(C)C(=O)c1ccc(C#Cc2ccc([C@H](O)[C@@H](C)O)cc2)cc1

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17434215 1.00
SCHEMBL17521201 1.00
SCHEMBL16070698 0.91
SCHEMBL16070615 0.91
SCHEMBL16070987 0.91
SCHEMBL16070656 0.87
SCHEMBL20707614 0.86
SCHEMBL16070691 0.86
SCHEMBL20953818 0.86
SCHEMBL20740934 0.86

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2975022-B1 NOVEL HYDROXAMIC ACID DERIVATIVE OR SALT THEREOF FUJIFILM TOYAMA CHEMICAL CO LTD (JP) 2019-05-08 EP disclosed
US-9862676-B2 Hydroxamic acid derivative or salt thereof TOYAMA CHEMICAL CO., LTD. (JP) 2018-01-09 US disclosed
US-20160039751-A1 NOVEL HYDROXAMIC ACID DERIVATIVE OR SALT THEREOF TOYAMA CHEMICAL CO., LTD. (JP) 2016-02-11 US disclosed
EP-2975022-A1 NOVEL HYDROXAMIC ACID DERIVATIVE OR SALT THEREOF Toyama Chemical Co., Ltd. (JP) 2016-01-20 EP disclosed