SCHEMBL17438438

SCHEMBL17438438

CCCC1(C#N)C=CC=CC1C(O)=S

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL2457288 0.86
SCHEMBL31192167 0.86
SCHEMBL5007778 0.78
SCHEMBL31019420 0.70
SCHEMBL21412875 0.67
SCHEMBL28491592 0.66
SCHEMBL8462147 0.63
SCHEMBL31406940 0.62
SCHEMBL14895458 0.61
SCHEMBL7864402 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 66 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116606393-A Amphiphilic compound, and medical resin composition and drug additive each comprising the same 株式会社日本触媒 2023-08-18 CN claimed
US-12578296-B2 Bio-electrode, and method for manufacturing the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2026-03-17 US disclosed
US-20250306464-A1 COMPOSITION FOR FORMING FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, MONOMER, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-10-02 US disclosed
EP-4625045-A2 COMPOSITION FOR FORMING FILM, METHOD FOR FORMING ORGANIC FILM, PATTERNING PROCESS, MONOMER, AND POLYMER SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-10-01 EP disclosed
US-12415930-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-16 US disclosed
US-12415931-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-09-16 US disclosed
US-12398288-B2 Conductive polymer composition, substrate, and method for producing substrate SHIN-ETSU CHEMICAL CO., LTD. (JP) 2025-08-26 US disclosed
US-12297302-B2 Amphiphilic compound, and medical resin composition and pharmaceutical additive using the same NIPPON SHOKUBAI CO., LTD. (JP) 2025-05-13 US disclosed
US-20250041430-A1 CONJUGATE COMPOUND AND METHOD FOR PRODUCING CONJUGATE COMPOUND NIPPON SHOKUBAI CO., LTD. (JP) 2025-02-06 US disclosed
CN-119335814-A Coating material for optical lithography, resist material, and pattern forming method 信越化学工业株式会社 2025-01-21 CN disclosed
US-10125202-B2 Polymer compound for a conductive polymer and method for producing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-11-13 US disclosed
US-20180237561-A1 POLYMER COMPOUND FOR CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-08-23 US disclosed
US-20180240564-A1 CONDUCTIVE POLYMER COMPOSITE AND SUBSTRATE SHIN-ETSU CHEMICAL CO., LTD. (JP) 2018-08-23 US disclosed
US-9777093-B2 Polymer compound for a conductive polymer and method for producing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-10-03 US disclosed
US-9663593-B2 Polymer compound for a conductive polymer and method for producing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-05-30 US disclosed
US-20170058059-A1 POLYMER COMPOUND FOR A CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-02 US disclosed
US-20170058066-A1 POLYMER COMPOUND FOR A CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-03-02 US disclosed
US-9527937-B2 Polymer compound for a conductive polymer and method for producing same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-12-27 US disclosed
US-20160017066-A1 POLYMER COMPOUND FOR A CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-21 US disclosed
US-20160017068-A1 POLYMER COMPOUND FOR A CONDUCTIVE POLYMER AND METHOD FOR PRODUCING SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-01-21 US disclosed