SCHEMBL17453161

SCHEMBL17453161

CCCCCCN(C)CCCS(=O)(=O)O

nearest known ligand 0.52

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
S1PR2 O95136 1/20 0.52
S1PR1 P21453 1/20 0.52
S1PR3 Q99500 1/20 0.52
S1PR5 Q9H228 1/20 0.52
GGPS1 O95749 4/20 0.44
KDM4C Q9H3R0 6/20 0.44
KDM5A P29375 5/20 0.44
PHF8 Q9UPP1 2/20 0.44
FDPS P14324 1/20 0.43
AGTR1 P30556 1/20 0.43
OPRM1 P35372 1/20 0.43
PDE3A Q14432 1/20 0.43
DNM1 Q05193 3/20 0.43
EPHX2 P34913 1/20 0.42
KDM5C P41229 1/20 0.41
KDM5B Q9UGL1 1/20 0.41
KDM4A O75164 2/20 0.40
FAAH O00519 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27518580 1.00 S1PR2 (0.52) S1PR2S1PR1S1PR3S1PR5GGPS1
SCHEMBL15939355 1.00 S1PR2 (0.52) S1PR2S1PR1S1PR3S1PR5GGPS1
SCHEMBL27730840 1.00 S1PR2 (0.52) S1PR2S1PR1S1PR3S1PR5GGPS1
SCHEMBL13155350 1.00 S1PR2 (0.52) S1PR2S1PR1S1PR3S1PR5GGPS1
SCHEMBL16311730 1.00 S1PR2 (0.52) S1PR2S1PR1S1PR3S1PR5GGPS1
SCHEMBL17817349 1.00 S1PR2 (0.52) S1PR2S1PR1S1PR3S1PR5GGPS1
SCHEMBL7246353 1.00 S1PR2 (0.52) S1PR2S1PR1S1PR3S1PR5GGPS1
SCHEMBL5339485 1.00 S1PR2 (0.52) S1PR2S1PR1S1PR3S1PR5GGPS1
SCHEMBL11553105 1.00 S1PR2 (0.52) S1PR2S1PR1S1PR3S1PR5GGPS1
SCHEMBL15870622 0.98 S1PR2 (0.48) S1PR2S1PR1S1PR3S1PR5GGPS1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-104448232-B Polyisocyanates that a kind of sulfamic acid is modified and its production and use 万华化学集团股份有限公司 2017-12-15 CN disclosed
US-20160018732-A1 ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, RESIST-COATED MASK BLANK, PHOTOMASK AND PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE USING THEM, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-01-21 US disclosed
CN-104448232-A Sulfamic acid modified polyisocyanate and preparation method and application thereof WANHUA CHEMICAL GROUP CO LTD 2015-03-25 CN disclosed