Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | TP53 | P04637 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12801820 | 0.67 | — | — | |
| SCHEMBL21375210 | 0.67 | — | — | |
| SCHEMBL12310674 | 0.67 | — | — | |
| SCHEMBL11569 | 0.65 | — | — | |
| SCHEMBL30782439 | 0.65 | — | — | |
| SCHEMBL4922 | 0.65 | — | — | |
| SCHEMBL5841 | 0.65 | — | — | |
| SCHEMBL473898 | 0.65 | — | — | |
| Trifluoroacetic Acid SCHEMBL3140803 | 0.62 | TP53 (0.44) | ALDH1A1LMNATP53 | |
| SCHEMBL23159219 | 0.62 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10792711-B2 | Substrate processing system, substrate cleaning method, and recording medium | TOKYO ELECTRON LIMITED (JP) | 2020-10-06 | — | — | US | disclosed |
| US-10272478-B2 | Substrate processing system, substrate cleaning method, and recording medium | TOKYO ELECTRON LIMITED (JP) | 2019-04-30 | — | — | US | disclosed |
| US-20190118227-A1 | SUBSTRATE PROCESSING SYSTEM, SUBSTRATE CLEANING METHOD, AND RECORDING MEDIUM | TOKYO ELECTRON LIMITED (JP) | 2019-04-25 | — | — | US | disclosed |
| US-10023827-B2 | Cleaning composition for semiconductor substrate and cleaning method | JSR CORPORATION (JP) | 2018-07-17 | — | — | US | disclosed |
| US-9818598-B2 | Substrate cleaning method and recording medium | TOKYO ELECTRON LIMITED (JP) | 2017-11-14 | — | — | US | disclosed |
| US-20170240851-A1 | CLEANING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE AND CLEANING METHOD | JSR CORPORATION (JP) | 2017-08-24 | — | — | US | disclosed |
| US-20160035561-A1 | SUBSTRATE PROCESSING SYSTEM, SUBSTRATE CLEANING METHOD, AND RECORDING MEDIUM | TOKYO ELECTRON LIMITED (JP) | 2016-02-04 | — | — | US | disclosed |
| US-20160032227-A1 | CLEANING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE AND CLEANING METHOD | JSR CORPORATION (JP) | 2016-02-04 | — | — | US | disclosed |
| US-20160035564-A1 | SUBSTRATE CLEANING METHOD AND RECORDING MEDIUM | JICC-02 CORPORATION (JP) | 2016-02-04 | — | — | US | disclosed |