SCHEMBL17474458

SCHEMBL17474458

COC(=O)Oc1cc[c]c(F)c1F

nearest known ligand 0.41

Predicted protein targets (top 12)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.41
HPGD P15428 1/20 0.41
HSD17B10 Q99714 1/20 0.41
MAPT P10636 2/20 0.36
HTT P42858 2/20 0.36
SMN1; SMN2 Q16637 2/20 0.36
JAK2 O60674 1/20 0.36
ALDH1A1 P00352 1/20 0.36
GAA P10253 1/20 0.36
GLA P06280 1/20 0.33
RECQL P46063 1/20 0.33
CUL4A Q13619 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL533456 0.75 CA12 (0.35)
SCHEMBL9672525 0.74 KDM4E (0.42) KDM4EHPGDHSD17B10MAPTHTT
SCHEMBL9672165 0.72 KDM4E (0.41) KDM4EHPGDHSD17B10MAPTHTT
SCHEMBL17474457 0.72 KDM4E (0.34) KDM4EHPGDHSD17B10
SCHEMBL17474471 0.71 TSHR (0.40) KDM4EHPGDHSD17B10MAPTSMN1; SMN2
SCHEMBL3342378 0.71 KDM4E (0.43) KDM4EHPGDHSD17B10MAPTHTT
SCHEMBL17355756 0.70 KDM4E (0.50) KDM4EHPGDHSD17B10MAPTHTT
SCHEMBL20591914 0.70 HSD17B10 (0.46) KDM4EHPGDHSD17B10MAPTHTT
SCHEMBL9673885 0.69 KDM4E (0.49) KDM4EHPGDHSD17B10MAPTHTT
SCHEMBL1567672 0.68 KMT2A (0.30)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10023827-B2 Cleaning composition for semiconductor substrate and cleaning method JSR CORPORATION (JP) 2018-07-17 US disclosed
US-20170240851-A1 CLEANING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE AND CLEANING METHOD JSR CORPORATION (JP) 2017-08-24 US disclosed
US-20160032227-A1 CLEANING COMPOSITION FOR SEMICONDUCTOR SUBSTRATE AND CLEANING METHOD JSR CORPORATION (JP) 2016-02-04 US disclosed