SCHEMBL17515693

SCHEMBL17515693

CCC(C)(CC(C)(CC(C)(CC(C)(CC(C)(C)C(=O)Oc1ccc(Oc2ccccc2)cc1)C(=O)Oc1ccc(Oc2ccccc2)cc1)C(=O)Oc1ccc(Oc2ccccc2)cc1)C(=O)Oc1ccc(Oc2ccccc2)cc1)C(=O)Oc1ccc(Oc2ccccc2)cc1

nearest known ligand 0.47

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ELANE P08246 6/20 0.47
PPARA Q07869 1/20 0.44
NPC1 O15118 3/20 0.40
RAB9A P51151 3/20 0.40
POLB P06746 1/20 0.40
CYP2C9 P11712 1/20 0.40
L3MBTL1 Q9Y468 2/20 0.39
HPGD P15428 1/20 0.39
CRHBP P24387 1/20 0.39
CRHR2 Q13324 1/20 0.39
MEN1 O00255 1/20 0.39
ALDH1A1 P00352 1/20 0.39
LMNA P02545 1/20 0.39
KMT2A Q03164 1/20 0.39
PPARG P37231 2/20 0.39
NPSR1 Q6W5P4 1/20 0.39
LTA4H P09960 2/20 0.38
NR1H2 P55055 1/20 0.38
BAX Q07812 1/20 0.38
SMN1; SMN2 Q16637 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL26499197 0.94 ELANE (0.43) ELANEPPARAL3MBTL1NPSR1
SCHEMBL16865917 0.89 ELANE (0.43) ELANENPC1RAB9ACYP2C9L3MBTL1
SCHEMBL12890662 0.89 ELANE (0.46) ELANEPPARAL3MBTL1ALDH1A1
SCHEMBL13805199 0.86 ELANE (0.48) ELANERAB9AL3MBTL1ALDH1A1NPSR1
SCHEMBL26499177 0.86 ELANE (0.47) ELANEMEN1ALDH1A1KMT2ALTA4H
SCHEMBL20100796 0.86 ELANE (0.47) ELANEMEN1ALDH1A1KMT2ALTA4H
SCHEMBL16200777 0.86 ELANE (0.47) ELANEMEN1ALDH1A1KMT2ALTA4H
SCHEMBL16865916 0.86 ELANE (0.47) ELANEMEN1ALDH1A1KMT2ALTA4H
SCHEMBL26498989 0.86 ELANE (0.47) ELANEMEN1ALDH1A1KMT2ALTA4H
SCHEMBL19397852 0.85 ELANE (0.47) ELANERAB9AL3MBTL1ALDH1A1NPSR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10031419-B2 Pattern forming method, composition kit and resist film, manufacturing method of electronic device using these, and electronic device FUJIFILM CORPORATION (JP) 2018-07-24 US disclosed
US-20160048075-A1 PATTERN FORMING METHOD, COMPOSITION KIT AND RESIST FILM, MANUFACTURING METHOD OF ELECTRONIC DEVICE USING THESE, AND ELECTRONIC DEVICE FUJIFILM CORPORATION (JP) 2016-02-18 US disclosed