Predicted protein targets (top 2)
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL8606973 | 0.86 | CA1 (0.44) | CA1CA9 | |
| SCHEMBL11203296 | 0.85 | CA1 (0.48) | CA1CA9 | |
| SCHEMBL28372803 | 0.85 | CA1 (0.48) | CA1CA9 | |
| SCHEMBL2382474 | 0.81 | CA1 (0.59) | CA1CA9 | |
| SCHEMBL28189755 | 0.81 | CA1 (0.47) | CA1CA9 | |
| SCHEMBL29208004 | 0.78 | CA1 (0.44) | CA1CA9 | |
| SCHEMBL26021 | 0.76 | CYP4F2 (0.37) | — | |
| SCHEMBL29229510 | 0.75 | CA1 (0.59) | CA1CA9 | |
| SCHEMBL28240854 | 0.75 | CA1 (0.59) | CA1CA9 | |
| Adipic Acid SCHEMBL29042036 | 0.74 | CA1 (0.46) | CA1CA9 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 30 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20160054840-A1 | TOUCH SENSOR WITH FRONT PANEL | ASAHI GLASS COMPANY, LIMITED (JP) | 2016-02-25 | — | — | US | disclosed |
| US-8815130-B2 | Method for producing a lens | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-08-26 | — | — | US | disclosed |
| US-8785108-B2 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2014-07-22 | — | — | US | disclosed |
| US-20130164543-A1 | FRONT PANEL FOR TOUCH SENSOR | ASAHI GLASS COMPANY, LIMITED (JP) | 2013-06-27 | — | — | US | disclosed |
| US-8268546-B2 | Variations in wettability; optically forming pattern; photocatalyst action upon pattern-wisw exposure;color filters, lenses, printing plates | DAI NIPPON PRINTING CO., LTD. (JP) | 2012-09-18 | — | — | US | disclosed |
| US-7998662-B2 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-08-16 | — | — | US | disclosed |
| US-7965446-B2 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-06-21 | — | — | US | disclosed |
| US-7943275-B2 | Color filter with colored layer on transparent substrate, plurality of colors formed in a predetermined pattern; light shielding layerformed through a wettability-variable component layer; titanium oxide photocatalyst; printing plates, lithography; polysiloxane or silicone binder | DAI NIPPON PRINTING CO., LTD. (JP) | 2011-05-17 | — | — | US | disclosed |
| EP-1376228-B1 | Process for producing a lens | DAINIPPON PRINTING CO LTD (JP) | 2010-10-13 | — | — | EP | disclosed |
| US-20100112311-A1 | STRUCTURE FOR PATTERN FORMATION, METHOD FOR PATTERN FORMATION, AND APPLICATION THEREOF | KOBAYASHI HIRONORI | 2010-05-06 | — | — | US | disclosed |
| US-20040019128-A1 | Curable white ink | KONICA CORPORATION (JP) | 2004-01-29 | — | — | US | disclosed |
| EP-1376225-A1 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1376224-A1 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1376226-A1 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1376229-A1 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1376227-A1 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| EP-1376228-A1 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. (JP) | 2004-01-02 | — | — | EP | disclosed |
| US-20020006558-A1 | Structure for pattern formation, method for pattern formation, and application thereof | DAI NIPPON PRINTING CO., LTD. | 2002-01-17 | — | — | US | disclosed |
| US-6294313-B1 | PHOTOCATALYST-CONTAINING LAYER CONTAINING A MATERIAL OF WHICH THE WETTABILITY IS VARIABLE THROUGH PHOTOCATALYTIC ACTION UPON PATTERN-WISE EXPOSURE. | DAI NIPPON PRINTING CO., LTD. (JP) | 2001-09-25 | — | — | US | disclosed |
| EP-0932081-A1 | PATTERN FORMING BODY, PATTERN FORMING METHOD, AND THEIR APPLICATIONS | DAI NIPPON PRINTING CO., LTD. (JP) | 1999-07-28 | — | — | EP | disclosed |