Phosphine

Phosphine

SCHEMBL175803

P.[InH3]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Phosphine SCHEMBL14991435 1.00
Phosphine SCHEMBL8731728 1.00
Phosphine SCHEMBL25270879 0.82
Phosphine SCHEMBL6664383 0.82
Methane SCHEMBL29205041 0.82
Phosphine SCHEMBL735540 0.82
Phosphine SCHEMBL10953742 0.82
Phosphine SCHEMBL15845043 0.82
Phosphine SCHEMBL9774053 0.82
Phosphine SCHEMBL28579138 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Appears in 3048 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-4704155-A1 SOLID-STATE IMAGING DEVICE AND ELECTRONIC APPARATUS Sony Semiconductor Solutions Corporation (JP) 2026-03-04 EP claimed
US-20250337214-A1 SEMICONDUCTOR LASER PACKAGES AND MODULES Anhui GaN Semiconductor Co., Ltd. (CN) 2025-10-30 US claimed
US-20250218859-A1 SEMICONDUCTOR DEVICE WITH CATALYTIC CONDUCTIVE LAYER AND METHOD FOR FABRICATING THE SAME NANYA TECHNOLOGY CORPORATION (TW) 2025-07-03 US claimed
US-20250218791-A1 SEMICONDUCTOR DEVICE WITH CATALYTIC CONDUCTIVE LAYER AND METHOD FOR FABRICATING THE SAME NANYA TECHNOLOGY CORPORATION (TW) 2025-07-03 US claimed
US-20250218861-A1 SEMICONDUCTOR DEVICE WITH CATALYTIC CONDUCTIVE LAYER AND METHOD FOR FABRICATING THE SAME NANYA TECHNOLOGY CORPORATION (TW) 2025-07-03 US claimed
CN-119921184-A Tunnel junction cascading multiple active region distributed feedback semiconductor laser and manufacturing method thereof 华侨大学 2025-05-02 CN claimed
CN-119894126-A InGaAsP Geiger avalanche diode and preparation method thereof 西南技术物理研究所 2025-04-25 CN claimed
CN-119108891-B Cutting path processing method 度亘核芯光电技术(苏州)有限公司 2025-04-08 CN claimed
US-12255220-B2 Light receiving element and electronic apparatus SONY SEMICONDUCTOR SOLUTIONS CORPORATION (JP) 2025-03-18 US claimed
EP-3584821-B1 COMPOUND SEMICONDUCTOR LAMINATE SUBSTRATE, METHOD FOR MANUFACTURING SAME, AND SEMICONDUCTOR ELEMENT SHINETSU CHEMICAL CO (JP) 2025-03-12 EP claimed
CN-1383218-A Process for preparing plarization controllable photoelectric device SEMICONDUCTOR INST CN ACAD (CN) 2002-12-04 CN claimed
CN-1377060-A Process for preparing SiO2 medium film on micron-class strip mesa FUCHUANGGUANG ELECTRONIC CO LT (CN) 2002-10-30 CN claimed
US-20010045995-A1 LIQUID CRYSTAL DISPLAY AND MANUFACTURING METHOD THERFOR MITSUBISHI DENKI KABUSHIKI KAISHA (JP) 2001-11-29 US claimed
EP-0752743-B1 Laser device with buried structure for integrated photonic circuit and method of fabrication FRANCE TELECOM (FR) 2001-06-06 EP claimed
EP-1096578-A2 Solid-state excimer devices and processes for producing same Okada, Fumio (JP) 2001-05-02 EP claimed
CN-1192587-A Field effect transistor MATSUSHITA ELECTRIC INDUSTRIAL CO LTD (JP) 1998-09-09 CN claimed
CN-1034251-C Transverse GalnAs photoelectric transistor and its integrating technique SEMICONDUCTOR INST CN ACAD (CN) 1997-03-12 CN claimed
US-5445692-A Process for reinforcing a semiconductor wafer SUMITOMO ELECTRIC INDUSTRIES, LTD. (JP) 1995-08-29 US claimed
CN-1094188-A GalnAs (GaInAs) lateral light electric transistor and integrated technology thereof SEMICONDUCTOR INST CN ACAD (CN) 1994-10-26 CN claimed
US-4394237-A Spectroscopic monitoring of gas-solid processes BELL TELEPHONE LABORATORIES, INCORPORATED (US) 1983-07-19 US claimed