SCHEMBL17589652

SCHEMBL17589652

O=C1OC2Cc3ccccc3CC2O1

nearest known ligand 0.47

Predicted protein targets (top 11)

geneUniProtsupporting neighboursconfidence
ANPEP P15144 1/20 0.41
SMN1; SMN2 Q16637 1/20 0.40
CYP1A2 P05177 1/20 0.39
IDO1 P14902 2/20 0.38
KMT2A Q03164 1/20 0.38
ACHE P22303 1/20 0.38
MAOA P21397 2/20 0.37
MAOB P27338 2/20 0.37
CA1 P00915 1/20 0.36
CA2 P00918 1/20 0.36
PLAU P00749 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18650081 0.81 KMT2A (0.44) ANPEPKMT2A
SCHEMBL11545276 0.74 ANPEP (0.36) ANPEPSMN1; SMN2CYP1A2IDO1KMT2A
SCHEMBL11553791 0.74 ANPEP (0.36) ANPEPSMN1; SMN2CYP1A2IDO1KMT2A
SCHEMBL27213573 0.74 IDO1 (0.44) ANPEPIDO1KMT2ACA1CA2
SCHEMBL1809864 0.74 IDO1 (0.44) ANPEPIDO1KMT2ACA1CA2
SCHEMBL2574223 0.74 IDO1 (0.44) ANPEPIDO1KMT2ACA1CA2
SCHEMBL11138446 0.74 IDO1 (0.44) ANPEPIDO1KMT2ACA1CA2
SCHEMBL18650080 0.70 SRD5A1 (0.43) IDO1CA1CA2
SCHEMBL10519024 0.70 IDO1 (0.41) ANPEPIDO1KMT2ACA1CA2
SCHEMBL23190683 0.67 KMT2A (0.42) ANPEPKMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9996002-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-06-12 US disclosed
US-9996002-B2 Resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-06-12 US disclosed
US-20160377980-A1 RESIST COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-12-29 US disclosed
US-20160077431-A1 RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-03-17 US disclosed