SCHEMBL175898

SCHEMBL175898

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nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14086857 1.00
SCHEMBL110 1.00
SCHEMBL10005363 1.00
SCHEMBL15271759 1.00
Xenon SCHEMBL3473457 0.82
Water SCHEMBL30973806 0.82
SCHEMBL3392229 0.82
SCHEMBL31296666 0.82
Water SCHEMBL29896548 0.82
Fluoride SCHEMBL2532789 0.82

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 11 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
JP-2282485-A None JP disclosed
CN-110382480-A Heterocyclylsulfonyl substituted pyridines and their use in the treatment of cancer 欧比力克治疗公司 2019-10-25 CN disclosed
CN-103620447-A Molding material, coating composition, and method for producing molding material TORAY INDUSTRIES 2014-03-05 CN disclosed
US-20120058250-A1 METHOD FOR PREPARATION OF BIOACTIVE GLASS COATINGS BY LIQUID PRECURSOR THERMAL SPRAY SI CHUAN UNIVERSITY (CN) 2012-03-08 US disclosed
WO-2011055860-A1 EXPOSURE APPARATUS, EXPOSURE METHOD, EXPOSURE APPARATUS MAINTENANCE METHOD, EXPOSURE APPARATUS ADJUSTMENT METHOD AND DEVICE MANUFACTURING METHOD NIKON CORPORATION (JP) 2011-05-12 WO disclosed
US-20110094630-A1 CHEMICAL CONVERSION SOLUTION FOR METAL STRUCTURE AND SURFACE TREATING METHOD HENKEL AG & CO. KGAA (DE) 2011-04-28 US disclosed
EP-2302098-A1 CHEMICAL CONVERSION LIQUID FOR METAL STRUCTURE AND SURFACE TREATING METHOD Henkel AG & Co. KGaA (DE) 2011-03-30 EP disclosed
CN-100487873-C Method of making a semiconductor device using treated photoresist FREESCALE SEMICONDUCTOR INC (US) 2009-05-13 CN disclosed
CN-100335975-C Color mixing agent and imaging method CANON KK (JP) 2007-09-05 CN disclosed
CN-1918700-A Method of making a semiconductor device using treated photoresist FREESCALE SEMICONDUCTOR INC (US) 2007-02-21 CN disclosed
JP-H02282485-A PRODUCTION OF BLACK ZINC PLATED STEEL SHEET NIPPON STEEL CORP 1990-11-20 JP disclosed