Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | MEN1 | O00255 | 8/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 8/20 | 0.40 |
| ▸ | MAPT | P10636 | 6/20 | 0.40 |
| ▸ | L3MBTL1 | Q9Y468 | 5/20 | 0.40 |
| ▸ | POLB | P06746 | 2/20 | 0.40 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.37 |
| ▸ | FGFR1 | P11362 | 5/20 | 0.35 |
| ▸ | TYMS | P04818 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 4/20 | 0.33 |
| ▸ | CRHBP | P24387 | 3/20 | 0.33 |
| ▸ | CRHR2 | Q13324 | 3/20 | 0.33 |
| ▸ | MAPK1 | P28482 | 3/20 | 0.33 |
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | KEAP1 | Q14145 | 2/20 | 0.33 |
| ▸ | NFE2L2 | Q16236 | 2/20 | 0.33 |
| ▸ | LMNA | P02545 | 2/20 | 0.33 |
| ▸ | ALOX15 | P16050 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.32 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.32 |
| ▸ | HPGD | P15428 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17617863 | 0.90 | MEN1 (0.41) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL13829143 | 0.86 | KMT2A (0.37) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL17617818 | 0.84 | TYMS (0.46) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL17617784 | 0.84 | MEN1 (0.41) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL17617824 | 0.84 | MAPT (0.39) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL17617819 | 0.82 | MAPT (0.39) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL13829197 | 0.81 | KMT2A (0.43) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL13829357 | 0.81 | MEN1 (0.37) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL17617780 | 0.80 | KMT2A (0.39) | MEN1KMT2AMAPTL3MBTL1POLB | |
| SCHEMBL17617790 | 0.79 | KMT2A (0.41) | MEN1KMT2AMAPTL3MBTL1POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20220026801-A1 | CHEMICALLY AMPLIFIED POSITIVE -TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD (JP) | 2022-01-27 | — | — | US | disclosed |
| US-20200209748-A1 | CHEMICALLY AMPLIFIED POSITIVE-TYPE PHOTOSENSITIVE RESIN COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, AND METHOD OF MANUFACTURING PLATED ARTICLE | TOKYO OHKA KOGYO CO., LTD. (JP) | 2020-07-02 | — | — | US | disclosed |
| EP-3182203-A1 | A COMBINATION OF NIT DERIVATIVES WITH SENSITIZERS | Heraeus Precious Metals North America Daychem LLC (US) | 2017-06-21 | — | — | EP | disclosed |
| US-9383644-B2 | Sulfonic acid derivative compounds as photoacid generators in resist applications | Heraeus Precious Metals North America Daychem LLC (US) | 2016-07-05 | — | — | US | disclosed |
| US-9383644-B2 | Sulfonic acid derivative compounds as photoacid generators in resist applications | Heraeus Precious Metals North America Daychem LLC (US) | 2016-07-05 | — | — | US | disclosed |
| US-20160085148-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC | 2016-03-24 | — | — | US | disclosed |
| WO-2016043941-A1 | SULFONIC DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | Heraeus Precious Metals North America Daychem LLC (US) | 2016-03-24 | — | — | WO | disclosed |
| US-20160085148-A1 | SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS | HERAEUS EPURIO LLC | 2016-03-24 | — | — | US | disclosed |