SCHEMBL17617820

SCHEMBL17617820

CCCSc1ccc2c3c(cccc13)C(=O)N(O)C2=O

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ POLB P06746 4/20 0.52
▸ MAPT P10636 4/20 0.52
▸ ERCC1 P07992 2/20 0.52
▸ FEN1 P39748 2/20 0.52
▸ ERCC4 Q92889 2/20 0.52
▸ TDP1 Q9NUW8 2/20 0.52
▸ CYP1A2 P05177 1/20 0.52
▸ TSHR P16473 1/20 0.52
▸ ALOX12 P18054 1/20 0.52
▸ KMT2A Q03164 9/20 0.52
▸ LMNA P02545 4/20 0.52
▸ HTT P42858 4/20 0.52
▸ KDM4E B2RXH2 3/20 0.52
▸ ALDH1A1 P00352 3/20 0.52
▸ XBP1 P17861 2/20 0.52
▸ PABPC1 P11940 1/20 0.52
▸ NFKB1 P19838 1/20 0.52
▸ SMARCA2 P51531 1/20 0.52
▸ NFKB2 Q00653 1/20 0.52
▸ RELA Q04206 1/20 0.52

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL13829366 0.92 KMT2A (0.50) POLBMAPTERCC1FEN1ERCC4
SCHEMBL13829120 0.90 POLB (0.48) POLBMAPTERCC1FEN1ERCC4
SCHEMBL17617822 0.87 MEN1 (0.54) POLBMAPTTDP1KMT2ALMNA
SCHEMBL13829367 0.84 KMT2A (0.48) POLBMAPTERCC1FEN1ERCC4
SCHEMBL13829104 0.83 KMT2A (0.47) POLBMAPTERCC1FEN1ERCC4
SCHEMBL17617816 0.81 TYMS (0.62) POLBMAPTTDP1CYP1A2KMT2A
SCHEMBL7712260 0.81 POLB (0.59) POLBMAPTERCC1FEN1ERCC4
SCHEMBL17617835 0.80 KMT2A (0.41) POLBMAPTTDP1CYP1A2KMT2A
SCHEMBL19015048 0.78 TYMS (0.40) POLBMAPTTDP1CYP1A2KMT2A
SCHEMBL17617826 0.77 POLB (0.55) POLBMAPTERCC1FEN1ERCC4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9383644-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications Heraeus Precious Metals North America Daychem LLC (US) 2016-07-05 — — US disclosed
US-9383644-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications Heraeus Precious Metals North America Daychem LLC (US) 2016-07-05 — — US disclosed
US-20160085148-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2016-03-24 — — US disclosed
US-20160085148-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2016-03-24 — — US disclosed
WO-2016043941-A1 SULFONIC DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS Heraeus Precious Metals North America Daychem LLC (US) 2016-03-24 — — WO disclosed
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