SCHEMBL17617850

SCHEMBL17617850

CCCCN(CCSc1ccc2c3c(cccc13)C(=O)N(OS(C)(=O)=O)C2=O)C(C)=O

nearest known ligand 0.38

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MEN1 O00255 3/20 0.38
▸ MAPT P10636 3/20 0.38
▸ KMT2A Q03164 3/20 0.38
▸ POLB P06746 2/20 0.38
▸ L3MBTL1 Q9Y468 2/20 0.38
▸ TYMS P04818 1/20 0.38
▸ TDP1 Q9NUW8 2/20 0.36
▸ FGFR1 P11362 5/20 0.36
▸ HTT P42858 2/20 0.33
▸ CYP1A2 P05177 1/20 0.33
▸ CYP3A4 P08684 1/20 0.33
▸ CYP2C9 P11712 1/20 0.33
▸ CYP2C19 P33261 1/20 0.33
▸ KDM4E B2RXH2 1/20 0.33
▸ ALDH1A1 P00352 1/20 0.33
▸ HPGD P15428 1/20 0.33
▸ BRD4 O60885 4/20 0.32
▸ PKM P14618 1/20 0.32
▸ RGS12 O14924 1/20 0.32
▸ USP2 O75604 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17613101 0.90 MEN1 (0.36) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL17617781 0.90 MEN1 (0.38) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL17617842 0.89 TYMS (0.40) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL18957987 0.83 MAPT (0.41) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL17617835 0.83 KMT2A (0.41) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL26068490 0.80 FGFR1 (0.48) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL17613107 0.79 MEN1 (0.38) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL17617849 0.77 KMT2A (0.40) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL17617851 0.75 TYMS (0.49) MEN1MAPTKMT2APOLBL3MBTL1
SCHEMBL17617861 0.75 BCL2 (0.42) MEN1MAPTKMT2APOLBL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9383644-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications Heraeus Precious Metals North America Daychem LLC (US) 2016-07-05 — — US disclosed
US-20160085148-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2016-03-24 — — US disclosed
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