SCHEMBL17617868

SCHEMBL17617868

CS(=O)(=O)ON1C(=O)c2cccc3c(SCCOCc4ccccc4)ccc(c23)C1=O

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ MAPT P10636 7/20 0.41
▸ KMT2A Q03164 7/20 0.41
▸ MEN1 O00255 6/20 0.41
▸ POLB P06746 2/20 0.41
▸ L3MBTL1 Q9Y468 1/20 0.41
▸ ALDH1A1 P00352 5/20 0.37
▸ HTT P42858 4/20 0.37
▸ KDM4E B2RXH2 4/20 0.37
▸ HPGD P15428 3/20 0.37
▸ CYP1B1 Q16678 4/20 0.35
▸ USP2 O75604 2/20 0.35
▸ RGS12 O14924 1/20 0.35
▸ LMNA P02545 1/20 0.35
▸ RECQL P46063 1/20 0.35
▸ NPC1 O15118 1/20 0.34
▸ RAB9A P51151 1/20 0.34
▸ TAAR1 Q96RJ0 1/20 0.34
▸ TYMS P04818 1/20 0.34
▸ PLK1 P53350 2/20 0.34
▸ F2 P00734 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17617824 0.88 MAPT (0.39) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL17617857 0.85 MAPT (0.45) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL17617849 0.85 KMT2A (0.40) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL17617863 0.83 MEN1 (0.41) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL17617835 0.83 KMT2A (0.41) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL17617852 0.82 KMT2A (0.39) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL26068490 0.82 FGFR1 (0.48) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL19015171 0.81 MAPT (0.35) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL17617860 0.80 TYMS (0.48) MAPTKMT2AMEN1POLBL3MBTL1
SCHEMBL18957987 0.79 MAPT (0.41) MAPTKMT2AMEN1POLBL3MBTL1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9383644-B2 Sulfonic acid derivative compounds as photoacid generators in resist applications Heraeus Precious Metals North America Daychem LLC (US) 2016-07-05 — — US disclosed
US-20160085148-A1 SULFONIC ACID DERIVATIVE COMPOUNDS AS PHOTOACID GENERATORS IN RESIST APPLICATIONS HERAEUS EPURIO LLC 2016-03-24 — — US disclosed
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