⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3119960 | 0.79 | — | — | |
| SCHEMBL26255520 | 0.79 | — | — | |
| SCHEMBL25174537 | 0.77 | — | — | |
| SCHEMBL9893547 | 0.76 | TSHR (0.30) | — | |
| SCHEMBL3119944 | 0.76 | TSHR (0.30) | — | |
| SCHEMBL25167036 | 0.76 | TSHR (0.30) | — | |
| SCHEMBL1905022 | 0.72 | — | — | |
| SCHEMBL9579139 | 0.72 | — | — | |
| SCHEMBL19844920 | 0.70 | — | — | |
| SCHEMBL20537180 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12584212-B2 | Compositions and methods using same for germanium seed layer | VERSUM MATERIALS US, LLC (US) | 2026-03-24 | — | — | US | claimed |
| CN-119912345-A | Preparation method of high-yield perfluorinated amine | 湖南源聚创新材料有限公司 | 2025-05-02 | — | — | CN | claimed |
| CN-117959959-A | Preparation of zwitterionic polymer modified hydrophilic polysulfone membrane | 青岛科技大学 | 2024-05-03 | — | — | CN | claimed |
| US-20230287562-A1 | COMPOSITIONS ND METHODS USING SAME FOR GERMANIUM SEED LAYER | VERSUM MATERIALS US, LLC | 2023-09-14 | — | — | US | claimed |
| CN-116653497-A | High-flame-retardance low-resistance fire-fighting truck tire with detection chip and preparation method thereof | 山东华盛橡胶有限公司 | 2023-08-29 | — | — | CN | claimed |
| EP-4176100-A1 | COMPOSITIONS AND METHODS USING SAME FOR GERMANIUM SEED LAYER | Versum Materials US, LLC (US) | 2023-05-10 | — | — | EP | claimed |
| CN-111995789-B | Hydrophilic resin for catalytic degradation of antibiotics and preparation method and application thereof | 武汉纺织大学 | 2022-09-27 | — | — | CN | claimed |
| WO-2022020705-A1 | COMPOSITIONS AND METHODS USING SAME FOR GERMANIUM SEED LAYER | VERSUM MATERIALS US, LLC (US) | 2022-01-27 | — | — | WO | claimed |
| US-12584212-B2 | Compositions and methods using same for germanium seed layer | VERSUM MATERIALS US, LLC (US) | 2026-03-24 | — | — | US | disclosed |
| CN-119912345-A | Preparation method of high-yield perfluorinated amine | 湖南源聚创新材料有限公司 | 2025-05-02 | — | — | CN | disclosed |
| CN-117959959-A | Preparation of zwitterionic polymer modified hydrophilic polysulfone membrane | 青岛科技大学 | 2024-05-03 | — | — | CN | disclosed |
| US-20230287562-A1 | COMPOSITIONS ND METHODS USING SAME FOR GERMANIUM SEED LAYER | VERSUM MATERIALS US, LLC | 2023-09-14 | — | — | US | disclosed |
| US-20230287562-A1 | COMPOSITIONS ND METHODS USING SAME FOR GERMANIUM SEED LAYER | VERSUM MATERIALS US, LLC | 2023-09-14 | — | — | US | disclosed |
| CN-116653497-A | High-flame-retardance low-resistance fire-fighting truck tire with detection chip and preparation method thereof | 山东华盛橡胶有限公司 | 2023-08-29 | — | — | CN | disclosed |
| US-10170298-B2 | High temperature silicon oxide atomic layer deposition technology | APPLIED MATERIALS, INC. (US) | 2019-01-01 | — | — | US | disclosed |
| US-20180346631-A1 | Functional Initiator For Anionic Polymerization | BRIDGESTONE CORPORATION (JP) | 2018-12-06 | — | — | US | disclosed |
| EP-3377538-A1 | FUNCTIONAL INITIATOR FOR ANIONIC POLYMERIZATION | Bridgestone Corporation (JP) | 2018-09-26 | — | — | EP | disclosed |
| US-20180076023-A1 | High Temperature Silicon Oxide Atomic Layer Deposition Technology | APPLIED MATERIALS INC (US) | 2018-03-15 | — | — | US | disclosed |
| US-9875888-B2 | High temperature silicon oxide atomic layer deposition technology | APPLIED MATERIALS, INC. (US) | 2018-01-23 | — | — | US | disclosed |
| US-20160099143-A1 | High Temperature Silicon Oxide Atomic Layer Deposition Technology | APPLIED MATERIALS, INC. | 2016-04-07 | — | — | US | disclosed |