⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL35875 | 0.83 | — | — | |
| Fluoride SCHEMBL28487381 | 0.79 | — | — | |
| SCHEMBL29280529 | 0.79 | — | — | |
| Hydrochloric Acid SCHEMBL11026631 | 0.79 | — | — | |
| Water SCHEMBL26665767 | 0.79 | — | — | |
| SCHEMBL27817181 | 0.79 | — | — | |
| Methylethylamine SCHEMBL28037522 | 0.76 | — | — | |
| Dimethylamine SCHEMBL15260753 | 0.72 | — | — | |
| Cyclopentane SCHEMBL28428949 | 0.72 | — | — | |
| Butane SCHEMBL3619323 | 0.70 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119899308-A | Dispersing agent and preparation method and application thereof | 湖北万润新能源科技股份有限公司 | 2025-04-29 | — | — | CN | claimed |
| EP-1172823-B1 | Porous materials | SHIPLEY CO LLC (US) | 2007-11-28 | — | — | EP | claimed |
| US-6599951-B2 | Organo polysilica dielectric material with removable porogen of chromophores; electronics | SHIPLEY COMPANY, L.L.C. | 2003-07-29 | — | — | US | claimed |
| US-6576681-B2 | Antireflective porogens | SHIPLEY COMPANY, L.L.C. | 2003-06-10 | — | — | US | claimed |
| US-20030022953-A1 | Antireflective porogens | SHIPLEY COMPANY, L.L.C. | 2003-01-30 | — | — | US | claimed |
| US-20020198269-A1 | Antireflective porogens | SHIPLEY COMPANY, L.L.C. | 2002-12-26 | — | — | US | claimed |
| US-20020065331-A1 | Antireflective porogens | SHIPLEY COMPANY, L.L.C. | 2002-05-30 | — | — | US | claimed |
| EP-1197998-A2 | Antireflective porogens | Shipley Company LLC (US) | 2002-04-17 | — | — | EP | claimed |
| EP-1172823-A1 | Porous materials | Shipley Company LLC (US) | 2002-01-16 | — | — | EP | claimed |
| US-6271273-B1 | Porous materials | SHIPLEY COMPANY, L.L.C. | 2001-08-07 | — | — | US | claimed |
| CN-119899308-A | Dispersing agent and preparation method and application thereof | 湖北万润新能源科技股份有限公司 | 2025-04-29 | — | — | CN | disclosed |
| US-8911927-B2 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2014-12-16 | — | — | US | disclosed |
| US-20110123937-A1 | COMPOSITIONS AND PROCESSES FOR IMMERSION LITHOGRAPHY | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-05-26 | — | — | US | disclosed |
| US-7781141-B2 | Compositions and processes for immersion lithography | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-08-24 | — | — | US | disclosed |
| US-7723850-B2 | Electronic devices having air gaps | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2010-05-25 | — | — | US | disclosed |
| EP-1245586-A2 | Polymer synthesis and films therefrom | Shipley Co. L.L.C. (US) | 2002-10-02 | — | — | EP | disclosed |
| US-20020065331-A1 | Antireflective porogens | SHIPLEY COMPANY, L.L.C. | 2002-05-30 | — | — | US | disclosed |
| EP-1197998-A2 | Antireflective porogens | Shipley Company LLC (US) | 2002-04-17 | — | — | EP | disclosed |
| EP-1172823-A1 | Porous materials | Shipley Company LLC (US) | 2002-01-16 | — | — | EP | disclosed |
| US-6271273-B1 | Porous materials | SHIPLEY COMPANY, L.L.C. | 2001-08-07 | — | — | US | disclosed |