SCHEMBL1765897

SCHEMBL1765897

CCNCC(O)(NCC)NCC

nearest known ligand 0.37

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
TP53 P04637 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Ammonia Solution, Strong SCHEMBL7176729 0.97 TP53 (0.35) TP53
SCHEMBL993289 0.73
SCHEMBL4659028 0.71 TP53 (0.41) TP53
SCHEMBL11576313 0.71
SCHEMBL3160885 0.71
Water SCHEMBL8187043 0.71
SCHEMBL1133057 0.71
SCHEMBL17677157 0.70 TP53 (0.35) TP53
SCHEMBL2014024 0.69 TP53 (0.39) TP53
SCHEMBL7064655 0.69 TP53 (0.39) TP53

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 51 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-117908340-A Organic stripping liquid for photoresist and preparation method and application thereof 绵阳艾萨斯电子材料有限公司 2024-04-19 CN claimed
CN-113176718-B Polyimide stripping liquid, preparation method thereof and cleaning method of polyimide film 肇庆微纳芯材料科技有限公司 2021-12-14 CN claimed
CN-113176718-A Polyimide stripping liquid, preparation method thereof and cleaning method of polyimide film 肇庆微纳芯材料科技有限公司 2021-07-27 CN claimed
CN-104781732-B Photoresist stripping liquid composition and stripping method of photoresist 东进世美肯株式会社 2019-12-17 CN claimed
US-8084184-B2 Composition for removing photoresist and method of manufacturing an array substrate using the same SAMSUNG ELECTRONICS CO., LTD. (KR) 2011-12-27 US claimed
US-20090170037-A1 COMPOSITION FOR REMOVING PHOTORESIST AND METHOD OF MANUFACTURING AN ARRAY SUBSTRATE USING THE SAME SAMSUNG ELECTRONICS CO., LTD. (KR) 2009-07-02 US claimed
US-20070169791-A1 Cleaning process Industry-University Cooperation Foundation Sogang University 2007-07-26 US claimed
WO-2005035828-A1 PHOTORESIST STRIPPING COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2005-04-21 WO claimed
WO-2001014934-A1 PHOTORESIST REMOVER COMPOSITION DONGJIN SEMICHEM CO., LTD. (KR) 2001-03-01 WO claimed
CN-117908340-A Organic stripping liquid for photoresist and preparation method and application thereof 绵阳艾萨斯电子材料有限公司 2024-04-19 CN disclosed
CN-111481469-B copolymer 宝丽化学工业有限公司 2023-09-19 CN disclosed
CN-111358713-B copolymer 宝丽化学工业有限公司 2023-09-19 CN disclosed
CN-111329787-B Copolymer 宝丽化学工业有限公司 2023-03-31 CN disclosed
CN-111329788-B Copolymer 宝丽化学工业有限公司 2023-03-31 CN disclosed
WO-1993013050-A1 NITROGENOUS MULTIACRYLIC MONOMERS, PREPARATION AND APPLICATION THEREOF IN PRODUCING NOVEL POLYMERS CRAY VALLEY S.A. (FR) 1993-07-08 WO disclosed
EP-0376761-A1 Feminine sanitary article for external use, and method for its manufacture DIFINTER SA (FR) 1990-07-04 EP disclosed
EP-0218722-B1 USE OF POLYMERIZABLE COMPOSITIONS PRODUCING POLYMERS HAVING GOOD THERMAL PROPERTIES AND APPLICATIONS OF THE OBTAINED POLYMERS INSTITUT NATIONAL DE RECHERCHE CHIMIQUE APPLIQUEE (FR) 1989-12-06 EP disclosed
US-4826887-A FOR POLYURETHANE FOAMS SHELL OIL COMPANY (US) 1989-05-02 US disclosed
US-4826953-A DOUBLE METAL CYANIDE CATALYST SHELL OIL COMPANY (US) 1989-05-02 US disclosed
US-4826952-A DOUBLE METAL CYANIDE CATALYST SHELL OIL COMPANY (US) 1989-05-02 US disclosed