⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14817572 | 0.93 | — | — | |
| SCHEMBL12240713 | 0.79 | — | — | |
| SCHEMBL13367160 | 0.76 | — | — | |
| SCHEMBL19046805 | 0.73 | — | — | |
| SCHEMBL19052351 | 0.73 | — | — | |
| SCHEMBL12240228 | 0.72 | — | — | |
| SCHEMBL19052354 | 0.67 | — | — | |
| SCHEMBL17484673 | 0.66 | — | — | |
| SCHEMBL19046896 | 0.63 | — | — | |
| SCHEMBL14866132 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20170351176-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK INCLUDING ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-12-07 | — | — | US | disclosed |
| US-20170115571-A1 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME | FUJIFILM CORPORATION (JP) | 2017-04-27 | — | — | US | disclosed |
| US-9316910-B2 | Pattern forming method, actinic-ray-sensitive or radiation-sensitive resin composition, and resist film | FUJIFILM CORPORATION (JP) | 2016-04-19 | — | — | US | disclosed |