SCHEMBL177416

SCHEMBL177416

[Si]Br

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1519 0.41
SCHEMBL689 0.41
SCHEMBL18614843 0.41
SCHEMBL27459101 0.41
SCHEMBL15206 0.33
SCHEMBL31301945 0.33
SCHEMBL57740 0.33
SCHEMBL1130909 0.33
SCHEMBL5873437 0.33
SCHEMBL23462252 0.00

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1335 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12642023-B2 Plasma etching processes TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2026-05-26 US claimed
CN-121584021-A Halogen compound and phosphate compound electrolyte for rechargeable magnesium battery, and preparation method and application thereof 南昌大学 2026-02-27 CN claimed
CN-112930581-B Method for depositing silicon nitride film 朗姆研究公司 2025-04-15 CN claimed
CN-119725091-A Chemical etching of molybdenum films ASM IP私人控股有限公司 2025-03-28 CN claimed
CN-119689630-A Low-loss optical fiber and preparation method thereof 江苏亨通光导新材料有限公司 2025-03-25 CN claimed
CN-113284799-B Method for manufacturing semiconductor device 住友电气工业株式会社 2025-03-21 CN claimed
CN-119542117-A Method for improving silicon deposition ASM IP私人控股有限公司 2025-02-28 CN claimed
US-12230495-B2 Method of depositing silicon nitride films LAM RESEARCH CORPORATION (US) 2025-02-18 US claimed
CN-115376908-B Etching method of GaN substrate 北京北方华创微电子装备有限公司 2025-01-17 CN claimed
US-20250022715-A1 PLASMA ETCHING PROCESSES TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) 2025-01-16 US claimed
EP-0289324-B1 METHOD FOR RACEMIZATION OF OPTICALLY ACTIVE CHRYSANTHEMIC ACID DERIVATIVES SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1992-07-08 EP claimed
EP-0480434-A2 Solid component of a catalyst for the homo- and co-polymerization of ethylene ENICHEM S.p.A. (IT) 1992-04-15 EP claimed
EP-0282221-B1 METHOD FOR RACEMIZATION OF OPTICALLY ACTIVE CHRYSANTHEMIC ACID OR ITS ESTER SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1992-01-15 EP claimed
US-5013700-A Water washing, acid leaching, heat treatment FALTH LARS (SE) 1991-05-07 US claimed
US-4820864-A Method for racemization of optically active chrysanthemic acid or its ester SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1989-04-11 US claimed
US-4812264-A Method for racemization of optically active chrysanthemic acid derivatives SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1989-03-14 US claimed
EP-0289324-A1 Method for racemization of optically active chrysanthemic acid derivatives SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1988-11-02 EP claimed
EP-0282221-A2 Method for racemization of optically active chrysanthemic acid or its ester SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 1988-09-14 EP claimed
US-4435587-A REACTION OF A SILICON HALIDE COMPOUND WITH AN ISOCYANATE OR CYANATE MATSUMOTO SEIYAKU KOGYO KABUSHIKI KAISHA (JP) 1984-03-06 US claimed
US-4102985-A Arc heater production of silicon involving a hydrogen reduction WESTINGHOUSE ELECTRIC CORP. (US) 1978-07-25 US claimed