Known targets — ChEMBL curated mechanism
ACHEADRA1AADRA1BADRA1DADRA2AADRA2BADRA2CADRB1ADRB2ADRB3APH1AAPH1BCHRM2CHRM3EZH2GRIN2AHTR1AHTR1BHTR1DHTR1FHTR3ANCSTNP2RY12PSEN1PSEN2PSENENSIGMAR1SLC6A2SLC6A3SLC6A4
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Bromide SCHEMBL2380638 | 1.00 | — | — | |
| Bromide SCHEMBL1232134 | 1.00 | — | — | |
| Bromide SCHEMBL2380632 | 1.00 | — | — | |
| Bromide SCHEMBL2380083 | 1.00 | — | — | |
| Bromide SCHEMBL42024 | 1.00 | — | — | |
| Bromide SCHEMBL2380090 | 1.00 | — | — | |
| Bromide SCHEMBL11800373 | 1.00 | — | — | |
| Bromide SCHEMBL11800367 | 1.00 | — | — | |
| Bromide SCHEMBL42026 | 1.00 | — | — | |
| Bromide SCHEMBL11155345 | 1.00 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 977 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12642023-B2 | Plasma etching processes | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2026-05-26 | — | — | US | claimed |
| CN-119318000-B | Back gate effect control via doping | 株式会社村田制作所 | 2026-05-15 | — | — | CN | claimed |
| CN-121584021-A | Halogen compound and phosphate compound electrolyte for rechargeable magnesium battery, and preparation method and application thereof | 南昌大学 | 2026-02-27 | — | — | CN | claimed |
| WO-2025238070-A1 | HYDROFLUOROCARBON COMPOUNDS AND THEIR USE IN INTEGRATED CIRCUIT MANUFACTURING PROCESSES | MERCK PATENT GMBH (DE) | 2025-11-20 | — | — | WO | claimed |
| WO-2025090723-A1 | HYDROFLUOROCARBON COMPOUNDS AND THEIR USE IN INTEGRATED CIRCUIT MANUFACTURING PROCESSES | VERSUM MATERIALS US, LLC (US) | 2025-05-01 | — | — | WO | claimed |
| CN-112930581-B | Method for depositing silicon nitride film | 朗姆研究公司 | 2025-04-15 | — | — | CN | claimed |
| US-12230495-B2 | Method of depositing silicon nitride films | LAM RESEARCH CORPORATION (US) | 2025-02-18 | — | — | US | claimed |
| US-20250022715-A1 | PLASMA ETCHING PROCESSES | TAIWAN SEMICONDUCTOR MANUFACTURING COMPANY, LTD. (TW) | 2025-01-16 | — | — | US | claimed |
| WO-2024234547-A1 | IMPLANTABLE BIOSENSOR AND PREPARATION METHOD THEREFOR | 广州达安基因股份有限公司 | 2024-11-21 | — | — | WO | claimed |
| US-20240332016-A1 | METHODS FOR SILICON GERMANIUM UNIFORMITY CONTROL USING MULTIPLE PRECURSORS | ASM IP HOLDING B.V. (NL) | 2024-10-03 | — | — | US | claimed |
| EP-0480434-A2 | Solid component of a catalyst for the homo- and co-polymerization of ethylene | ENICHEM S.p.A. (IT) | 1992-04-15 | — | — | EP | claimed |
| EP-0282221-B1 | METHOD FOR RACEMIZATION OF OPTICALLY ACTIVE CHRYSANTHEMIC ACID OR ITS ESTER | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1992-01-15 | — | — | EP | claimed |
| US-5013700-A | Water washing, acid leaching, heat treatment | FALTH LARS (SE) | 1991-05-07 | — | — | US | claimed |
| US-4820864-A | Method for racemization of optically active chrysanthemic acid or its ester | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1989-04-11 | — | — | US | claimed |
| US-4812264-A | Method for racemization of optically active chrysanthemic acid derivatives | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1989-03-14 | — | — | US | claimed |
| EP-0289324-A1 | Method for racemization of optically active chrysanthemic acid derivatives | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1988-11-02 | — | — | EP | claimed |
| EP-0282221-A2 | Method for racemization of optically active chrysanthemic acid or its ester | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 1988-09-14 | — | — | EP | claimed |
| US-4435587-A | REACTION OF A SILICON HALIDE COMPOUND WITH AN ISOCYANATE OR CYANATE | MATSUMOTO SEIYAKU KOGYO KABUSHIKI KAISHA (JP) | 1984-03-06 | — | — | US | claimed |
| US-4362885-A | Process for the manufacture of (iodoorganyl)alkoxysilanes | DEGUSSA AKTIENGESELLSCHAFT (DE) | 1982-12-07 | — | — | US | claimed |
| US-4102985-A | Arc heater production of silicon involving a hydrogen reduction | WESTINGHOUSE ELECTRIC CORP. (US) | 1978-07-25 | — | — | US | claimed |