SCHEMBL17752185

SCHEMBL17752185

C=C(C)C(=O)OC(C)(C)C(=O)OC1CCCCC1

nearest known ligand 0.42

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
CYP19A1 P11511 1/20 0.42
EPHX1 P07099 2/20 0.37
NAAA Q02083 2/20 0.34
HTT P42858 2/20 0.34
NPC1 O15118 1/20 0.34
RAB9A P51151 1/20 0.34
SMN1; SMN2 Q16637 1/20 0.34
CHRM3 P20309 7/20 0.32
CYP2C19 P33261 2/20 0.32
ALDH1A1 P00352 1/20 0.31
CHRM2 P08172 3/20 0.31
LMNA P02545 1/20 0.31
CYP2D6 P10635 1/20 0.31
SLC6A4 P31645 1/20 0.31
KCNH2 Q12809 1/20 0.31
CA12 O43570 1/20 0.31
CA1 P00915 1/20 0.31
CA2 P00918 1/20 0.31
CA9 Q16790 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL21841167 0.84 CYP19A1 (0.42) CYP19A1EPHX1NAAAHTTNPC1
SCHEMBL7064390 0.83 CYP19A1 (0.46) CYP19A1EPHX1NAAAHTTNPC1
SCHEMBL3709223 0.83 CYP19A1 (0.46) CYP19A1EPHX1NAAAHTTNPC1
SCHEMBL21841152 0.82 CYP19A1 (0.40) CYP19A1EPHX1NAAAHTTNPC1
SCHEMBL9130045 0.82 EPHX1 (0.38) CYP19A1EPHX1NAAAHTTNPC1
SCHEMBL17752191 0.82 CYP19A1 (0.39) CYP19A1EPHX1NAAAHTTNPC1
SCHEMBL4675444 0.81 CYP19A1 (0.44) CYP19A1EPHX1NAAAHTTNPC1
SCHEMBL4675441 0.81 CYP19A1 (0.44) CYP19A1EPHX1NAAAHTTNPC1
Methane SCHEMBL28111858 0.81 EPHX1 (0.44) CYP19A1EPHX1NAAAHTTNPC1
SCHEMBL17754074 0.80 CYP19A1 (0.37) CYP19A1EPHX1NAAAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9971241-B2 Compound, resin, resist composition and method for producing resist pattern SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2018-05-15 US disclosed
US-20160139508-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2016-05-19 US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160139508-A1 COMPOUND, RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN AFF1, AFF2, AFF4 CYP19A1 630/4885EPHX1 923/4885NAAA 3161/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.