⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9296442 | 0.82 | — | — | |
| SCHEMBL213298 | 0.82 | — | — | |
| Lithium Ion SCHEMBL669241 | 0.67 | — | — | |
| SCHEMBL4300171 | 0.67 | — | — | |
| SCHEMBL1685627 | 0.67 | — | — | |
| SCHEMBL10581781 | 0.67 | — | — | |
| SCHEMBL4272865 | 0.67 | — | — | |
| SCHEMBL540783 | 0.67 | — | — | |
| SCHEMBL16874046 | 0.67 | — | — | |
| SCHEMBL1070533 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-9349687-B1 | Advanced manganese/manganese nitride cap/etch mask for air gap formation scheme in nanocopper low-K interconnect | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-05-24 | — | — | US | claimed |
| US-9349687-B1 | Advanced manganese/manganese nitride cap/etch mask for air gap formation scheme in nanocopper low-K interconnect | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2016-05-24 | — | — | US | disclosed |