SCHEMBL17826765

SCHEMBL17826765

Cc1ccc(C)c(C(=O)OC(C(C)C)C(F)(F)C(=O)O)c1

nearest known ligand 0.40

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ UTS2R Q9UKP6 1/20 0.40
▸ TSHR P16473 2/20 0.40
▸ LMNA P02545 1/20 0.40
▸ MEN1 O00255 3/20 0.39
▸ KMT2A Q03164 3/20 0.39
▸ MAPT P10636 4/20 0.38
▸ ALDH1A1 P00352 2/20 0.38
▸ KDM4E B2RXH2 1/20 0.38
▸ PKM P14618 1/20 0.38
▸ SMN1; SMN2 Q16637 2/20 0.37
▸ NPC1 O15118 1/20 0.37
▸ HPGD P15428 1/20 0.37
▸ POLB P06746 2/20 0.36
▸ CYP2C9 P11712 2/20 0.36
▸ NPSR1 Q6W5P4 1/20 0.36
▸ CSNK2A1 P68400 1/20 0.34
▸ TTR P02766 1/20 0.34
▸ CYP1A2 P05177 1/20 0.34
▸ CYP2C8 P10632 1/20 0.34
▸ CHRM1 P11229 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL23559371 0.87 NOTUM (0.33) UTS2RTDP1NOTUM
SCHEMBL17826775 0.81 UTS2R (0.41) UTS2RTSHRLMNAMEN1KMT2A
SCHEMBL16589188 0.80 TDP1 (0.43) LMNAMEN1KMT2AMAPTALDH1A1
SCHEMBL23559378 0.79 — —
SCHEMBL23559373 0.78 PLAU (0.36) —
SCHEMBL23382543 0.77 NOTUM (0.36) UTS2RTSHRHTR2BNOTUM
SCHEMBL23559366 0.76 NOTUM (0.40) TSHRMEN1KMT2AMAPTALDH1A1
SCHEMBL23559268 0.75 CA12 (0.33) —
SCHEMBL23559267 0.74 PTPN2 (0.38) TSHRMEN1KMT2AALDH1A1KDM4E
SCHEMBL16589186 0.74 TSHR (0.47) TSHRLMNAMEN1KMT2AMAPT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3032333-B1 SHRINK MATERIAL AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2017-05-24 — — EP disclosed
EP-3032332-B1 SHRINK MATERIAL AND PATTERN FORMING PROCESS SHINETSU CHEMICAL CO (JP) 2017-04-05 — — EP disclosed
EP-3032332-A2 SHRINK MATERIAL AND PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2016-06-15 — — EP disclosed
EP-3032333-A2 SHRINK MATERIAL AND PATTERN FORMING PROCESS Shin-Etsu Chemical Co., Ltd. (JP) 2016-06-15 — — EP disclosed
Send feedback