SCHEMBL17826957

SCHEMBL17826957

CCC(C)OC(C)COC

nearest known ligand 0.35

Predicted protein targets (top 1)

geneUniProtsupporting neighboursconfidence
MAPK1 P28482 1/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL430915 0.88 MAPK1 (0.42) MAPK1
SCHEMBL28222277 0.82 HSD17B10 (0.44) MAPK1
SCHEMBL14000783 0.82
SCHEMBL147241 0.82
SCHEMBL5791362 0.82
SCHEMBL6375215 0.81
SCHEMBL17280901 0.79
Ethane SCHEMBL7007928 0.78 MAPK1 (0.44) MAPK1
Potassium SCHEMBL9541959 0.78 MAPK1 (0.44) MAPK1
Phosphine SCHEMBL21561433 0.78 MAPK1 (0.44) MAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10025191-B2 Polymer-containing coating liquid applied to resist pattern NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2018-07-17 US disclosed
US-20170084864-A1 PROCESS FOR PRODUCING AN INSULATOR LAYER, PROCESS FOR PRODUCING AN ORGANIC OPTOELECTRONIC COMPONENT COMPRISING AN INSULATOR LAYER AND ORGANIC OPTOELECTRONIC COMPONENT COMPRISING AN INSULATOR LAYER DOLYA HOLDCO 5 LIMITED (IE) 2017-03-23 US disclosed
US-20160363867-A1 POLYMER-CONTAINING COATING LIQUID APPLIED TO RESIST PATTERN NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-12-15 US disclosed
US-20160363867-A1 POLYMER-CONTAINING COATING LIQUID APPLIED TO RESIST PATTERN NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2016-12-15 US disclosed
EP-1594003-B1 Lithographic printing plate precursor and lithographic printing method FUJIFILM CORP (JP) 2016-06-15 EP disclosed