SCHEMBL178331

SCHEMBL178331

FC(F)C(F)(F)C(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL17061012 1.00
Lithium SCHEMBL31624618 0.95
SCHEMBL8955846 0.80
SCHEMBL9200475 0.77
SCHEMBL865023 0.74
SCHEMBL1992683 0.74
SCHEMBL4060206 0.74
SCHEMBL155953 0.74
SCHEMBL15402993 0.74
SCHEMBL726505 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1345 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12410368-B2 Etching gas composition, substrate processing apparatus, and pattern forming method using the etching gas composition SEMES CO., LTD. (KR) 2025-09-09 US claimed
CN-119977753-A Process for producing iodofluorocarbon compounds 阿科玛法国公司 2025-05-13 CN claimed
US-20250051251-A1 PROCESS FOR THE PREPARATION AND PURIFICATION OF TRIFLUOROETHYLENE ARKEMA FRANCE (FR) 2025-02-13 US claimed
US-12183591-B2 Etching gas compositions, methods of forming micropatterns, and methods of manufacturing semiconductor device SAMSUNG ELECTRONICS CO., LTD. (KR) 2024-12-31 US claimed
US-20240392192-A1 ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE BY USING THE SAME SEMES CO., LTD. (KR) 2024-11-28 US claimed
US-20240392191-A1 ETCHING GAS COMPOSITION AND METHOD OF MANUFACTURING INTEGRATED CIRCUIT DEVICE USING THE SAME SEMES CO., LTD. (KR) 2024-11-28 US claimed
EP-4452911-A1 PROCESS FOR THE PREPARATION AND PURIFICATION OF TRIFLUOROETHYLENE ARKEMA FRANCE (FR) 2024-10-30 EP claimed
EP-3472671-B1 A RINSE COMPOSITION, A METHOD FOR FORMING RESIST PATTERNS AND A METHOD FOR MAKING SEMICONDUCTOR DEVICES MERCK PATENT GMBH (DE) 2024-06-26 EP claimed
WO-2024119001-A1 COATED POLYHYDROXYALKANOATES FOR PACKAGING VALENCE GLOBAL, INC. (US) 2024-06-06 WO claimed
WO-2024078443-A1 COMBINED NANODRUG PREPARATION, PREPARATION METHOD THEREFOR, AND APPLICATION THEREOF 哈尔滨医科大学 2024-04-18 WO claimed
EP-0570367-A4 FIRE EXTINGUISHING COMPOSITION AND PROCESS. DU PONT (US) 1993-09-28 EP claimed
EP-0557275-A1 FIRE EXTINGUISHING COMPOSITION AND PROCESS. DU PONT (US) 1993-09-01 EP claimed
US-5141654-A Fluoro-substituted ethane E. I. DU PONT DE NEMOURS AND COMPANY (US) 1992-08-25 US claimed
EP-0494987-A1 FIRE EXTINGUISHING COMPOSITION AND PROCESS. DU PONT (US) 1992-07-22 EP claimed
WO-1992008519-A1 FIRE EXTINGUISHING COMPOSITION AND PROCESS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-05-29 WO claimed
WO-1992008520-A1 FIRE EXTINGUISHING COMPOSITION AND PROCESS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1992-05-29 WO claimed
US-5115868-A Trifluoromethane in combination with other halogenated hydrocarbons; no ozone depletin, jaff for humans E. I. DU PONT DE NEMOURS AND COMPANY (US) 1992-05-26 US claimed
EP-0494987-A4 FIRE EXTINGUISHING COMPOSITION AND PROCESS. DU PONT (US) 1992-05-14 EP claimed
US-5084190-A Flluoro substituted propanes for extinguishing fires without e ffecting the ozone layer E. I. DU PONT DE NEMOURS AND COMPANY (US) 1992-01-28 US claimed
WO-1991004766-A1 FIRE EXTINGUISHING COMPOSITION AND PROCESS E.I. DU PONT DE NEMOURS AND COMPANY (US) 1991-04-18 WO claimed