⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL16708341 | 0.91 | — | — | |
| SCHEMBL23974125 | 0.87 | DPP8 (0.32) | — | |
| SCHEMBL2610378 | 0.83 | — | — | |
| SCHEMBL776317 | 0.82 | — | — | |
| SCHEMBL7455858 | 0.81 | — | — | |
| SCHEMBL15290901 | 0.81 | — | — | |
| SCHEMBL3291365 | 0.81 | TSHR (0.30) | — | |
| SCHEMBL18634042 | 0.80 | CYP17A1 (0.32) | — | |
| SCHEMBL15290903 | 0.80 | — | — | |
| SCHEMBL17850103 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 8 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-3035121-B1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHINETSU CHEMICAL CO (JP) | 2019-03-13 | — | — | EP | disclosed |
| US-9758609-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-9758609-B2 | Monomer, polymer, resist composition, and patterning process | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-09-12 | — | — | US | disclosed |
| US-20170108775-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-20 | — | — | US | disclosed |
| US-20170108775-A1 | RESIST COMPOSITION AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2017-04-20 | — | — | US | disclosed |
| US-20160179002-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-23 | — | — | US | disclosed |
| US-20160179002-A1 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-23 | — | — | US | disclosed |
| EP-3035121-A2 | MONOMER, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-06-22 | — | — | EP | disclosed |