⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3314240 | 0.79 | — | — | |
| SCHEMBL83558 | 0.76 | — | — | |
| SCHEMBL21067031 | 0.76 | — | — | |
| SCHEMBL28069990 | 0.76 | — | — | |
| SCHEMBL1067767 | 0.72 | — | — | |
| SCHEMBL7116355 | 0.69 | HSD17B10 (0.44) | — | |
| SCHEMBL11399369 | 0.69 | — | — | |
| SCHEMBL12657389 | 0.67 | HSD17B10 (0.35) | — | |
| SCHEMBL1896137 | 0.67 | — | — | |
| SCHEMBL20819 | 0.67 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 25 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12312309-B2 | 3-acyloxymethyl-3-butenal acetal compounds | SHIN-ETSU CHEMICAL CO, LTD. (JP) | 2025-05-27 | — | — | US | disclosed |
| US-12312310-B2 | Methods of producing 7-methyl-3-methylene-7-octenal acetal compounds | SHIN-ETSU CHEMICAL CO, LTD. (JP) | 2025-05-27 | — | — | US | disclosed |
| US-20240067595-A1 | 3-ACYLOXYMETHYL-3-BUTENAL ACETAL COMPOUNDS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-02-29 | — | — | US | disclosed |
| US-11897842-B2 | Method for producing 7-methyl-3-methylene-7-octenal acetal compound | SHIN-ETSU CHEMICAL CO, LTD. | 2024-02-13 | — | — | US | disclosed |
| US-20240025837-A1 | METHODS OF PRODUCING 7-METHYL-3-METHYLENE-7-OCTENAL ACETAL COMPOUNDS | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2024-01-25 | — | — | US | disclosed |
| CN-105732296-B | 7-methyl-3-methyl-7-octenyl halide, preparation method thereof and method for preparing 7-methyl-3-methyl-7-octenyl propionate | 信越化学工业株式会社 | 2023-05-02 | — | — | CN | disclosed |
| US-20220306565-A1 | 7-METHYL-3-METHYLENE-7-OCTENAL ACETAL COMPOUND AND METHODS FOR PRODUCING ALDEHYDE COMPOUND AND ESTER COMPOUND USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-09-29 | — | — | US | disclosed |
| US-11384046-B2 | 7-methyl-3-methylene-7-octenal acetal compound and methods for producing aldehyde compound and ester compound using the same | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2022-07-12 | — | — | US | disclosed |
| CN-109956850-B | Process for producing 3, 7-dimethyl-7-octenyl alcohol and 3, 7-dimethyl-7-octenyl carboxylate compound | 信越化学工业株式会社 | 2022-06-21 | — | — | CN | disclosed |
| CN-108164403-B | 7-methyl-3-methylene-7-octenal acetal compound and method for producing aldehydes and esters using the same | 信越化学工业株式会社 | 2022-01-18 | — | — | CN | disclosed |
| US-20190194099-A1 | METHOD FOR PRODUCING 3,7-DIMETHYL-7-OCTENOL AND METHOD FOR PRODUCING 3,7-DIMETHYL-7-OCTENYL CARBOXYLATE COMPOUND | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2019-06-27 | — | — | US | disclosed |
| EP-3098226-B1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORP (JP) | 2018-12-12 | — | — | EP | disclosed |
| US-10100070-B2 | Borate-based base generator, and base-reactive composition comprising such base generator | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2018-10-16 | — | — | US | disclosed |
| EP-3333149-A1 | 7-METHYL-3-METHYLENE-7-OCTENAL ACETAL COMPOUND AND METHODS FOR PRODUCING ALDEHYDE COMPOUND AND ESTER COMPOUND USING THE SAME | Shin-Etsu Chemical Co., Ltd. (JP) | 2018-06-13 | — | — | EP | disclosed |
| US-20180155267-A1 | 7-METHYL-3-METHYLENE-7-OCTENAL ACETAL COMPOUND AND METHODS FOR PRODUCING ALDEHYDE COMPOUND AND ESTER COMPOUND USING THE SAME | SHIN-ETSU CHEMICAL CO., LTD. | 2018-06-07 | — | — | US | disclosed |
| EP-3098226-A1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | Wako Pure Chemical Industries, Ltd. (JP) | 2016-11-30 | — | — | EP | disclosed |
| US-20160340374-A1 | BORATE-BASED BASE GENERATOR, AND BASE-REACTIVE COMPOSITION COMPRISING SUCH BASE GENERATOR | FUJIFILM WAKO PURE CHEMICAL CORPORATION (JP) | 2016-11-24 | — | — | US | disclosed |
| US-9481619-B2 | 7-methyl-3-methylene-7-octenyl halide, method for producing the same, and method for producing 7-methyl-3-methylene-7-octenyl propionate | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-11-01 | — | — | US | disclosed |
| US-20160185690-A1 | 7-METHYL-3-METHYLENE-7-OCTENYL HALIDE, METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING 7-METHYL-3-METHYLENE-7-OCTENYL PROPIONATE | SHIN-ETSU CHEMICAL CO., LTD. (JP) | 2016-06-30 | — | — | US | disclosed |
| EP-3037403-A1 | 7-METHYL-3-METHYLENE-7-OCTENYL HALIDE, METHOD FOR PRODUCING THE SAME, AND METHOD FOR PRODUCING 7-METHYL-3-METHYLENE-7-OCTENYL PROPIONATE | Shin-Etsu Chemical Co., Ltd. (JP) | 2016-06-29 | — | — | EP | disclosed |