Tetrazole

Tetrazole

SCHEMBL17874201

c1nnn[nH]1.c1nnn[nH]1.c1nnn[nH]1.c1nnn[nH]1

nearest known ligand 0.00

Full drug profile on Sugi Atlas →

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Tetrazole SCHEMBL877 1.00
Tetrazole SCHEMBL6130451 0.96
Tetrazole SCHEMBL7089941 0.96
Tetrazole SCHEMBL1356089 0.96
Tetrazole SCHEMBL600056 0.96
Tetrazole SCHEMBL21856 0.96
Tetrazole SCHEMBL9322264 0.96
Tetrazole SCHEMBL3521152 0.96
Tetrazole SCHEMBL3715450 0.96
Tetrazole SCHEMBL6266187 0.96

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-3237563-A1 USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT AND / OR CO-BALT ALLOY COMPRISING SUBSTRATES BASF SE (DE) 2017-11-01 EP disclosed
WO-2016102279-A1 USE OF A CHEMICAL MECHANICAL POLISHING (CMP) COMPOSITION FOR POLISHING OF COBALT AND / OR CO-BALT ALLOY COMPRISING SUBSTRATES BASF SE (DE) 2016-06-30 WO disclosed