⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17879745 | 0.82 | — | — | |
| SCHEMBL22723689 | 0.77 | — | — | |
| SCHEMBL20110625 | 0.72 | — | — | |
| SCHEMBL17883744 | 0.72 | MRGPRX4 (0.33) | — | |
| SCHEMBL17879746 | 0.69 | SERPINE1 (0.33) | — | |
| SCHEMBL17879726 | 0.69 | MRGPRX4 (0.30) | — | |
| SCHEMBL17879739 | 0.65 | ACP1 (0.36) | — | |
| SCHEMBL22723667 | 0.63 | — | — | |
| SCHEMBL26239531 | 0.63 | — | — | |
| SCHEMBL17879751 | 0.62 | HSD17B10 (0.38) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-10481495-B2 | Topcoat compositions containing fluorinated thermal acid generators | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-11-19 | — | — | US | disclosed |
| US-20190243246-A1 | TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2019-08-08 | — | — | US | disclosed |
| US-10241411-B2 | Topcoat compositions containing fluorinated thermal acid generators | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-03-26 | — | — | US | disclosed |
| US-10241407-B2 | Thermal acid generators and photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2019-03-26 | — | — | US | disclosed |
| US-10007179-B2 | Thermal acid generators and photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-06-26 | — | — | US | disclosed |
| US-10007179-B2 | Thermal acid generators and photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2018-06-26 | — | — | US | disclosed |
| US-20180118968-A1 | TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-05-03 | — | — | US | disclosed |
| US-20180118968-A1 | TOPCOAT COMPOSITIONS CONTAINING FLUORINATED THERMAL ACID GENERATORS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2018-05-03 | — | — | US | disclosed |
| US-9696629-B2 | Photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-07-04 | — | — | US | disclosed |
| US-9696629-B2 | Photoresist pattern trimming compositions and methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2017-07-04 | — | — | US | disclosed |
| US-20170123313-A1 | THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | ROHM & HAAS ELECT MAT (US) | 2017-05-04 | — | — | US | disclosed |
| US-20170123314-A1 | THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-05-04 | — | — | US | disclosed |
| US-20170123314-A1 | THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2017-05-04 | — | — | US | disclosed |
| US-20170123313-A1 | THERMAL ACID GENERATORS AND PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | ROHM & HAAS ELECT MAT (US) | 2017-05-04 | — | — | US | disclosed |
| US-20160187783-A1 | PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-06-30 | — | — | US | disclosed |
| US-20160187783-A1 | PHOTORESIST PATTERN TRIMMING COMPOSITIONS AND METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2016-06-30 | — | — | US | disclosed |