Formaldehyde

Formaldehyde

SCHEMBL17890332

C=O.C=O.C=O.C=O.C=O.C=O.[Co]

nearest known ligand 0.00

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⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Formaldehyde SCHEMBL15717785 1.00
Formaldehyde SCHEMBL3677815 1.00
Formaldehyde SCHEMBL19064493 1.00
Formaldehyde SCHEMBL56421 1.00
Formaldehyde SCHEMBL1453233 0.89
Formaldehyde SCHEMBL28222694 0.89
Formaldehyde SCHEMBL28472460 0.89
Formaldehyde SCHEMBL27779593 0.89
Formaldehyde SCHEMBL27264113 0.89
Formaldehyde SCHEMBL27951926 0.89

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-10355098-B2 Method of manufacturing semiconductor device Kokusai Electric Corporation (JP) 2019-07-16 US disclosed
US-20160293421-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE AND RECORDING MEDIUM HITACHI KOKUSAI ELECTRIC INC. (JP) 2016-10-06 US disclosed
US-20160196980-A1 METHOD OF MANUFACTURING SEMICONDUCTOR DEVICE HITACHI KOKUSAI ELECTRIC INC. (JP) 2016-07-07 US disclosed