⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2514572 | 0.67 | — | — | |
| SCHEMBL2514570 | 0.67 | — | — | |
| SCHEMBL36456 | 0.67 | — | — | |
| Water SCHEMBL15412681 | 0.63 | — | — | |
| SCHEMBL6680699 | 0.63 | — | — | |
| Hydrochloric Acid SCHEMBL7206471 | 0.63 | — | — | |
| SCHEMBL3421119 | 0.63 | — | — | |
| Ammonia Solution, Strong SCHEMBL9647 | 0.63 | — | — | |
| SCHEMBL1060118 | 0.63 | — | — | |
| Phosphine SCHEMBL15013438 | 0.63 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-109563243-B | Fluorine atom-containing polymer and use thereof | 日产化学株式会社 | 2022-07-08 | — | — | CN | disclosed |
| EP-3168250-B1 | FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF | NISSAN CHEMICAL CORP (JP) | 2020-02-26 | — | — | EP | disclosed |
| US-10199578-B2 | Fluorine-atom-containing polymer and use thereof | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2019-02-05 | — | — | US | disclosed |
| US-20170200897-A1 | FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF | NISSAN CHEMICAL INDUSTRIES, LTD. (JP) | 2017-07-13 | — | — | US | disclosed |
| US-9671692-B2 | Compound, resin and photoresist composition | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-06-06 | — | — | US | disclosed |
| EP-3168250-A1 | FLUORINE-ATOM-CONTAINING POLYMER AND USE THEREOF | Nissan Chemical Industries, Ltd. (JP) | 2017-05-17 | — | — | EP | disclosed |
| US-9575408-B2 | Photoresist composition and method for producing photoresist pattern | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2017-02-21 | — | — | US | disclosed |
| US-20160244400-A1 | COMPOUND, RESIN AND PHOTORESIST COMPOSITION | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-08-25 | — | — | US | disclosed |
| US-20160195809-A1 | PHOTORESIST COMPOSITION AND METHOD FOR PRODUCING PHOTORESIST PATTERN | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2016-07-07 | — | — | US | disclosed |