⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL714482 | 1.00 | — | — | |
| Ammonia Solution, Strong SCHEMBL29239273 | 0.97 | — | — | |
| SCHEMBL9239950 | 0.89 | — | — | |
| SCHEMBL28896695 | 0.79 | — | — | |
| SCHEMBL109550 | 0.78 | TSHR (0.33) | — | |
| SCHEMBL109549 | 0.78 | TSHR (0.33) | — | |
| SCHEMBL17764763 | 0.78 | TSHR (0.33) | — | |
| SCHEMBL4954083 | 0.78 | — | — | |
| SCHEMBL202032 | 0.78 | — | — | |
| SCHEMBL28645397 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-20110123925-A1 | POLYMER FOR PROTECTIVE LAYER OF RESIST, AND POLYMER COMPOSITION INCLUDING THE SAME | CHEIL INDUSTRIES, INC. (KR) | 2011-05-26 | — | — | US | disclosed |
| US-20110123933-A1 | POLYMER, COMPOSITION FOR PROTECTIVE LAYER, AND PATTERNING METHOD USING THE SAME | CHEIL INDUSTRIES, INC. (KR) | 2011-05-26 | — | — | US | disclosed |