Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CA1 | P00915 | 3/20 | 0.67 |
| ▸ | CA9 | Q16790 | 2/20 | 0.67 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.48 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | CA2 | P00918 | 1/20 | 0.43 |
| ▸ | CA4 | P22748 | 1/20 | 0.43 |
| ▸ | LMNA | P02545 | 3/20 | 0.40 |
| ▸ | ESR2 | Q92731 | 3/20 | 0.40 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.40 |
| ▸ | HSP90AA1 | P07900 | 2/20 | 0.40 |
| ▸ | HSP90AB1 | P08238 | 2/20 | 0.40 |
| ▸ | NR1I2 | O75469 | 1/20 | 0.40 |
| ▸ | TP53 | P04637 | 1/20 | 0.40 |
| ▸ | POLB | P06746 | 1/20 | 0.40 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 1/20 | 0.40 |
| ▸ | ESR1 | P03372 | 1/20 | 0.39 |
| ▸ | MEN1 | O00255 | 1/20 | 0.38 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.35 |
| ▸ | MMP3 | P08254 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3903307 | 1.00 | CA1 (0.67) | CA1CA9SMN1; SMN2KMT2ACA2 | |
| SCHEMBL15660000 | 1.00 | CA1 (0.67) | CA1CA9SMN1; SMN2KMT2ACA2 | |
| SCHEMBL3818992 | 1.00 | CA1 (0.67) | CA1CA9SMN1; SMN2KMT2ACA2 | |
| SCHEMBL15656167 | 1.00 | CA1 (0.67) | CA1CA9SMN1; SMN2KMT2ACA2 | |
| SCHEMBL3082261 | 1.00 | CA1 (0.67) | CA1CA9SMN1; SMN2KMT2ACA2 | |
| SCHEMBL24668102 | 1.00 | CA1 (0.67) | CA1CA9SMN1; SMN2KMT2ACA2 | |
| SCHEMBL3090419 | 1.00 | CA1 (0.67) | CA1CA9SMN1; SMN2KMT2ACA2 | |
| SCHEMBL3075568 | 1.00 | CA1 (0.67) | CA1CA9SMN1; SMN2KMT2ACA2 | |
| SCHEMBL12950185 | 1.00 | CA1 (0.67) | CA1CA9SMN1; SMN2KMT2ACA2 | |
| SCHEMBL11697947 | 1.00 | CA1 (0.67) | CA1CA9SMN1; SMN2KMT2ACA2 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 74 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-113123171-A | Preparation method of milk-flavor cigarette paper | 河南中烟工业有限责任公司 | 2021-07-16 | — | — | CN | claimed |
| US-6557561-B1 | Lactone salt | JAPAN TOBACCO INC. (JP) | 2003-05-06 | — | — | US | claimed |
| US-6372823-B1 | WATER DISPERSIBLE RESIN OF HYDROXY BISPHENOL A EPOXY RESINS WITH CYCLIC ESTERS AND WITH AMINE COMPOUND, NEUTRALIZATION WITH ACID, VINYL RESIN, POLYOXYALKYLENE GLYCOL AND PIGMENTS | KANSAI PAINT CO., LTD. (JP) | 2002-04-16 | — | — | US | claimed |
| US-20240241443-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR PRODUCING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2024-07-18 | — | — | US | disclosed |
| CN-113123171-A | Preparation method of milk-flavor cigarette paper | 河南中烟工业有限责任公司 | 2021-07-16 | — | — | CN | disclosed |
| EP-2735581-B1 | COMPOSITION AND POLYMER | ASAHI CHEMICAL IND (JP) | 2021-07-14 | — | — | EP | disclosed |
| US-9951163-B2 | (Meth)acrylate compound, (meth)acrylic copolymer and photosensitive resin composition containing same | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2018-04-24 | — | — | US | disclosed |
| US-20170351179-A1 | COMPOSITION FOR FORMING UPPER LAYER FILM, PATTERN FORMING METHOD USING THE SAME, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2017-12-07 | — | — | US | disclosed |
| US-9738757-B2 | Composition and polymer | ASAHI KASEI CHEMICALS CORPORATION (JP) | 2017-08-22 | — | — | US | disclosed |
| US-9709891-B2 | Positive resist composition, resin used for the positive resist composition, compound used for synthesis of the resin and pattern forming method using the positive resist composition | FUJIFILM CORPORATION (JP) | 2017-07-18 | — | — | US | disclosed |
| US-9612535-B2 | Pattern forming method, electron beam- or extreme ultraviolet-sensitive resin composition, resist film using the same, method of manufacturing electronic device, and electronic device | FUJIFILM CORPORATION (JP) | 2017-04-04 | — | — | US | disclosed |
| US-20080248425-A1 | Adjust solubility of alkali developer using acid; acid generator; actinic radiation | FUJIFILM CORPORATION (JP) | 2008-10-09 | — | — | US | disclosed |
| US-20080187860-A1 | PATTERN FORMING METHOD, RESIST COMPOSITION FOR MULTIPLE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, DEVELOPER FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD, AND RINSING SOLUTION FOR NEGATIVE DEVELOPMENT USED IN THE PATTERN FORMING METHOD | FUJIFILM CORPORATION (JP) | 2008-08-07 | — | — | US | disclosed |
| US-20070082289-A1 | Photosensitive composition, pattern forming method using the photosensitive composition and compound for use in the photosensitive composition | FUJI PHOTO FILM CO., LTD. | 2007-04-12 | — | — | US | disclosed |
| US-20070077519-A1 | Pattern forming method and resist composition used therefor | FUJI PHOTO FILM CO., LTD. | 2007-04-05 | — | — | US | disclosed |
| US-6652960-B1 | Amine modified epoxy resin and polyisocyanate; corrosion resistance, adhesion, finishing | KANSAI PAINT CO., LTD. (JP) | 2003-11-25 | — | — | US | disclosed |
| EP-1099542-B1 | Plastic-coated metal plate | KANSAI PAINT CO LTD (JP) | 2003-10-01 | — | — | EP | disclosed |
| US-6372823-B1 | WATER DISPERSIBLE RESIN OF HYDROXY BISPHENOL A EPOXY RESINS WITH CYCLIC ESTERS AND WITH AMINE COMPOUND, NEUTRALIZATION WITH ACID, VINYL RESIN, POLYOXYALKYLENE GLYCOL AND PIGMENTS | KANSAI PAINT CO., LTD. (JP) | 2002-04-16 | — | — | US | disclosed |
| EP-1099542-A1 | Plastic-coated metal plate | KANSAI PAINT CO., LTD. (JP) | 2001-05-16 | — | — | EP | disclosed |
| WO-1997026926-A1 | AIR FRESHENER COMPOSITION CONTAINING A FIBER PAD | EASTMAN CHEMICAL COMPANY (US) | 1997-07-31 | — | — | WO | disclosed |