⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Ethylene SCHEMBL9810762 | 0.80 | — | — | |
| Ethylene SCHEMBL2465282 | 0.80 | — | — | |
| Ethylene SCHEMBL1952662 | 0.78 | — | — | |
| Ethylene SCHEMBL5144595 | 0.78 | — | — | |
| Ethylene SCHEMBL15121 | 0.78 | — | — | |
| Ethylene SCHEMBL3135482 | 0.78 | — | — | |
| Ethylene SCHEMBL42885 | 0.78 | — | — | |
| Ethylene SCHEMBL105475 | 0.78 | — | — | |
| Ethylene SCHEMBL526684 | 0.78 | — | — | |
| Ethylene SCHEMBL8567644 | 0.78 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7943516-B2 | Manufacturing method for semiconductor device | RENESAS ELECTRONICS CORPORATION (JP) | 2011-05-17 | — | — | US | disclosed |
| US-20080214002-A1 | Cleaning solution and manufacturing method for semiconductor device | NEC ELETRONICS CORPORATION (JP) | 2008-09-04 | — | — | US | disclosed |
| US-7368064-B2 | Hydrofluoric acid, ammonium fluoride, or amine fluoride; chelating agent (ammonium malonate, glycolate, tartrate or citrate); carboxylic ammonium salt having acid dissociation constant pKan of 2.5 or greater at 25 degrees C.; water; for cleaning a substrate on which a nickel silicide layer is formed | NEC ELECTRONICS CORPORATION (JP) | 2008-05-06 | — | — | US | disclosed |
| CN-1322105-C | Cleaning solution and manufacturing method for semiconductor device | NEC ELECTRONICS CORP (JP) | 2007-06-20 | — | — | CN | disclosed |
| CN-1690183-A | Cleaning solution and manufacturing method for semiconductor device | NEC ELECTRONICS CORP (JP) | 2005-11-02 | — | — | CN | disclosed |
| US-20050236362-A1 | Cleaning solution and manufacturing method for semiconductor device | NEC ELECTRONICS CORPORATION (JP) | 2005-10-27 | — | — | US | disclosed |