⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Water SCHEMBL28211585 | 0.97 | — | — | |
| Hydrochloric Acid SCHEMBL28106515 | 0.97 | — | — | |
| SCHEMBL8522322 | 0.92 | — | — | |
| SCHEMBL28849523 | 0.89 | EPHX1 (0.48) | — | |
| SCHEMBL5203363 | 0.89 | EPHX1 (0.48) | — | |
| SCHEMBL9295907 | 0.89 | EPHX1 (0.48) | — | |
| SCHEMBL6914040 | 0.89 | EPHX1 (0.48) | — | |
| SCHEMBL11748589 | 0.89 | EPHX1 (0.48) | — | |
| SCHEMBL16618599 | 0.89 | EPHX1 (0.48) | — | |
| SCHEMBL11650879 | 0.89 | EPHX1 (0.48) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 106 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-107357142-B | Aqueous photoresist stripping liquid and preparation method thereof | 杭州格林达电子材料股份有限公司 | 2021-01-26 | — | — | CN | claimed |
| CN-111117223-A | Nylon material for automobile bearing and preparation method thereof | 南京聚隆科技股份有限公司 | 2020-05-08 | — | — | CN | claimed |
| US-4076537-A | Light-sensitive materials containing organo tellurium or selenium compounds and sensitizers | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-28 | — | — | US | claimed |
| CN-113574041-B | Bisphenol production method and polycarbonate resin production method | 三菱化学株式会社 | 2023-10-13 | — | — | CN | disclosed |
| CN-113574041-A | Method for producing bisphenol and method for producing polycarbonate resin | 三菱化学株式会社 | 2021-10-29 | — | — | CN | disclosed |
| CN-108699694-B | Electroless plating base agent comprising highly branched polymer and metal fine particles | 日产化学株式会社 | 2021-03-12 | — | — | CN | disclosed |
| US-10920179-B2 | Cleaning solution and method for cleaning substrate | TOKYO OHKA KOGYO CO., LTD. (JP) | 2021-02-16 | — | — | US | disclosed |
| CN-107357142-B | Aqueous photoresist stripping liquid and preparation method thereof | 杭州格林达电子材料股份有限公司 | 2021-01-26 | — | — | CN | disclosed |
| WO-2020189201-A1 | METHOD FOR PRODUCING BISPHENOL AND METHOD FOR PRODUCING POLYCARBONATE RESIN | 三菱ケミカル株式会社 | 2020-09-24 | — | — | WO | disclosed |
| CN-111117223-A | Nylon material for automobile bearing and preparation method thereof | 南京聚隆科技股份有限公司 | 2020-05-08 | — | — | CN | disclosed |
| CN-110382637-A | Printable molecular ink | 加拿大国家研究委员会 | 2019-10-25 | — | — | CN | disclosed |
| WO-1990001024-A1 | NOVEL MAGNETIC RESONANCE IMAGING AGENTS | MALLINCKRODT, INC. (US) | 1990-02-08 | — | — | WO | disclosed |
| WO-1988003544-A1 | AMIDE MODIFIED EPOXY RESINS | THE DOW CHEMICAL COMPANY (US) | 1988-05-19 | — | — | WO | disclosed |
| EP-0266694-A2 | Amide modified epoxy resins | THE DOW CHEMICAL COMPANY (US) | 1988-05-11 | — | — | EP | disclosed |
| US-4721742-A | Amide modified epoxy resins from a dialkanolamine, a monoalkanolamine, an anhydride and (an) unsaturated monomer(s) | THE DOW CHEMICAL COMPANY (US) | 1988-01-26 | — | — | US | disclosed |
| US-4609747-A | Novel water-soluble antimony compounds and their preparation | ATLANTIC RICHFIELD (US) | 1986-09-02 | — | — | US | disclosed |
| EP-0103895-A2 | Novel hydroxylamine derivatives, production and use thereof | MEIJI SEIKA KABUSHIKI KAISHA (JP) | 1984-03-28 | — | — | EP | disclosed |
| US-4076537-A | Light-sensitive materials containing organo tellurium or selenium compounds and sensitizers | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-28 | — | — | US | disclosed |
| US-4076530-A | Dry photographic copying method for producing Te images | FUJI PHOTO FILM CO., LTD. (JA) | 1978-02-28 | — | — | US | disclosed |
| US-4062685-A | ORGANO-TELLURIUM COMPOUND | FUJI PHOTO FILM CO., LTD. (JA) | 1977-12-13 | — | — | US | disclosed |