SCHEMBL18022202

SCHEMBL18022202

CCC(C)C(=O)OC1C2CC3C1OC(=O)C3(C(=O)OC(C)(C)C)C2

nearest known ligand 0.34

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
▸ HMGCR P04035 5/20 0.34
▸ KDM4E B2RXH2 2/20 0.30
▸ ABCB11 O95342 2/20 0.30
▸ LMNA P02545 2/20 0.30
▸ ITGB2 P05107 2/20 0.30
▸ ICAM1 P05362 2/20 0.30
▸ PGR P06401 2/20 0.30
▸ ABCB1 P08183 2/20 0.30
▸ CYP3A4 P08684 2/20 0.30
▸ ADORA3 P0DMS8 2/20 0.30
▸ MAPT P10636 2/20 0.30
▸ ADRB3 P13945 2/20 0.30
▸ ALOX15 P16050 2/20 0.30
▸ TSHR P16473 2/20 0.30
▸ ITGAL P20701 2/20 0.30
▸ TACR2 P21452 2/20 0.30
▸ TBXA2R P21731 2/20 0.30
▸ SLC6A2 P23975 2/20 0.30
▸ ADORA1 P30542 2/20 0.30
▸ AGTR1 P30556 2/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18022201 0.89 HMGCR (0.34) HMGCRKDM4EABCB11LMNAITGB2
SCHEMBL19261129 0.89 — —
SCHEMBL17853800 0.86 HMGCR (0.34) HMGCRKDM4EABCB11LMNAITGB2
SCHEMBL9608731 0.85 HMGCR (0.31) HMGCR
SCHEMBL16591147 0.85 HMGCR (0.31) HMGCR
SCHEMBL17853750 0.84 — —
SCHEMBL10178832 0.83 HMGCR (0.35) HMGCRKDM4EABCB11PGRABCB1
SCHEMBL10178810 0.82 HMGCR (0.30) HMGCR
SCHEMBL10293987 0.80 KDM4E (0.31) KDM4EMAPTTDP1
SCHEMBL785961 0.79 HMGCR (0.33) HMGCR

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-9740100-B2 Hemiacetal compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-08-22 — — US disclosed
US-9740100-B2 Hemiacetal compound, polymer, resist composition, and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2017-08-22 — — US disclosed
US-20160238930-A1 HEMIACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-18 — — US disclosed
US-20160238930-A1 HEMIACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2016-08-18 — — US disclosed

Patent text — is the patent's own abstract consistent with the prediction?

For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.

PatentTitleText reads most aboutPredicted target · text-rank
US-20160238930-A1 HEMIACETAL COMPOUND, POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS H1-3, H1-0, H1-2 HMGCR 1623/4885KDM4E 1231/4885ABCB11 2977/4885

“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.

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