SCHEMBL1802845

SCHEMBL1802845

OCCOCCOCCOCC(O)F

nearest known ligand 0.55

Predicted protein targets (top 9)

geneUniProtsupporting neighboursconfidence
MEN1 O00255 2/20 0.55
KMT2A Q03164 2/20 0.55
TSHR P16473 2/20 0.50
MAPK1 P28482 1/20 0.50
THRB P10828 1/20 0.38
HTT P42858 1/20 0.38
MAPT P10636 1/20 0.38
ALDH1A1 P00352 1/20 0.36
HSD17B10 Q99714 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL27605158 1.00 MEN1 (0.55) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL29094130 1.00 MEN1 (0.55) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL29094129 1.00 MEN1 (0.55) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL29094122 0.95
SCHEMBL15798786 0.91 MEN1 (0.46) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL15798788 0.88 MEN1 (0.42) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL5021533 0.79 MEN1 (0.61) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL18251584 0.79 MEN1 (0.61) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL15253483 0.79 MEN1 (0.61) MEN1KMT2ATSHRMAPK1THRB
SCHEMBL6666230 0.79 MEN1 (0.61) MEN1KMT2ATSHRMAPK1THRB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 14 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-118791699-A Dynamic covalent adaptation polyurethane network composite material and preparation method and application thereof 东华大学 2024-10-18 CN disclosed
CN-116964028-A Process for producing carbonyl halide 国立大学法人神户大学 2023-10-27 CN disclosed
CN-116940548-A Process for producing carbonyl halide 国立大学法人神户大学 2023-10-24 CN disclosed
CN-113402432-A Photosensitive molecule and preparation method of surface enhanced Raman detection substrate containing photosensitive molecule 华东理工大学 2021-09-17 CN disclosed
CN-104903102-B Stack membrane 东丽株式会社 2017-12-19 CN disclosed
CN-104023969-B The manufacture method of moulding material, coating composition and moulding material 东丽株式会社 2016-09-28 CN disclosed
EP-1772918-B1 CURABLE RESIN COMPOSITION FOR FUEL CELL ELECTROLYTE FILM, ELECTROLYTE FILM AND PROCESS FOR PRODUCING THE SAME, ELECTROLYTE FILM/ELECTRODE ASSEMBLY AND PROCESS FOR PRODUCING THE SAME SHINETSU CHEMICAL CO (JP) 2015-08-12 EP disclosed
CN-104023969-A Molding material, coating composition and method for manufacturing molding material TORAY INDUSTRIES 2014-09-03 CN disclosed
US-20130234080-A1 CONDUCTIVE PROTECTIVE FILM, TRANSFER MEMBER, PROCESS CARTRIDGE, AND IMAGE-FORMING APPARATUS FUJI XEROX CO., LTD. (JP) 2013-09-12 US disclosed
US-7951503-B2 Curable resin composition for fuel cell electrolyte film and electrolyte film, process for producing the same, electrolyte film/electrode assembly, and process for producing the same SHIN-ETSU CHEMICAL CO., LTD. (JP) 2011-05-31 US disclosed
US-20070160888-A1 CURABLE RESIN COMPOSITION FOR FUEL CELL ELECTROLYTE FILM AND ELECTROLYTE FILM, PROCESS FOR PRODUCING THE SAME, ELECTROLYTE FILM/ELECTRODE ASSEMBLY, AND PROCESS FOR PRODUCING THE SAME SHIN-ETSU CHEMICAL CO., LTD. (JP) 2007-07-12 US disclosed
EP-1772918-A1 CURABLE RESIN COMPOSITION FOR FUEL CELL ELECTROLYTE FILM AND ELECTROLYTE FILM, PROCESS FOR PRODUCING THE SAME, ELECTROLYTE FILM/ELECTRODE ASSEMBLY, AND PROCESS FOR PRODUCING THE SAME Shinetsu Chemical Co., Ltd. (JP) 2007-04-11 EP disclosed
CN-1831032-A Halogenated optical polymer composition CORNING INC (US) 2006-09-13 CN disclosed
CN-1628141-A Halogenated optical polymer compositions DU PONT (US) 2005-06-15 CN disclosed