SCHEMBL1807453

SCHEMBL1807453

Nc1cc(Cl)c(Cc2cc(Cl)c(N)cc2Cl)cc1Cl

nearest known ligand 0.63

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GAA P10253 2/20 0.63
CYP3A4 P08684 4/20 0.44
TSHR P16473 3/20 0.39
TP53 P04637 1/20 0.39
CD44 P16070 1/20 0.39
NPC1 O15118 1/20 0.38
ALDH1A1 P00352 5/20 0.37
MAPK1 P28482 1/20 0.37
CA12 O43570 2/20 0.36
CA1 P00915 2/20 0.36
CA2 P00918 2/20 0.36
CA7 P43166 2/20 0.36
CA9 Q16790 2/20 0.36
CA14 Q9ULX7 2/20 0.36
CYP1A2 P05177 1/20 0.36
ALOX15 P16050 1/20 0.36
CASP7 P55210 1/20 0.36
HIF1A Q16665 1/20 0.36
HSD17B10 Q99714 1/20 0.36
SMN1; SMN2 Q16637 2/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18650984 0.87 CD44 (0.56) GAACYP3A4TSHRTP53CD44
SCHEMBL29225682 0.86 GAA (0.50) GAACYP3A4TSHRTP53CD44
SCHEMBL11678925 0.84 GAA (0.44) GAACYP3A4TSHRTP53ALDH1A1
SCHEMBL11680707 0.84 GAA (0.44) GAACYP3A4TSHRTP53ALDH1A1
SCHEMBL9694622 0.84 CYP3A4 (0.74) GAACYP3A4TSHRTP53ALDH1A1
SCHEMBL11679107 0.83 GAA (0.48) GAACYP3A4TSHRTP53CD44
SCHEMBL9514609 0.82 GAA (0.60) GAACYP3A4TSHRTP53CD44
SCHEMBL10705350 0.81 CYP3A4 (0.70) GAACYP3A4TSHRTP53ALDH1A1
SCHEMBL10948580 0.80 GAA (0.57) GAACYP3A4TSHRTP53CD44
SCHEMBL31045274 0.80 GAA (0.57) GAACYP3A4TSHRTP53CD44

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250250460-A1 COATING KIT AND METHOD FOR REPAIR AND/OR RECONSTITUTION OF RUBBER AND/OR METAL WORN AREAS BERTECH PANAMA S.A. (PA) 2025-08-07 US claimed
WO-2024052724-A1 COATING KIT AND METHOD FOR REPAIR AND/OR RECONSTITUTION OF RUBBER AND/OR METAL WORN AREAS BERTECH PANAMÁ S.A. (PA) 2024-03-14 WO claimed
US-6949589-B2 Elastic foamed grinder material and method for producing the same OYAIZU YOSHIJIRO 2005-09-27 US claimed
US-20030066245-A1 Elastic foamed grinder material and method for producing the same OYAIZU YOSHIJIRO (JP) 2003-04-10 US claimed
EP-0579989-B1 Polyurethaneurea elastomer IHARA CHEMICAL IND CO (JP) 1997-09-03 EP claimed
US-5410009-A Impact resilience; flexural properties IHARA CHEMICAL INDUSTRY CO., LTD. (JP) 1995-04-25 US claimed
US-5306828-A Catalytic imidation of malic anhydride with amine in solvent mixture BROMINE COMPOUNDS LTD. (IL) 1994-04-26 US claimed
EP-0579989-A1 Polyurethaneurea elastomer IHARA CHEMICAL INDUSTRY Co., Ltd. (JP) 1994-01-26 EP claimed
US-5039775-A Process for producing polyurea resin IHARA CHEMICAL INDUSTRY CO., LTD. (JP) 1991-08-13 US claimed
US-4107151-A FROM POLYISOCYANATE, CHAIN POLYOL, AROMATIC DIAMINE, POLYOL OR AMINO ALCOHOL WITH URETHANE BOND IHARA CHEMICAL COMPANY CO., LTD. (JP) 1978-08-15 US claimed
US-20250250460-A1 COATING KIT AND METHOD FOR REPAIR AND/OR RECONSTITUTION OF RUBBER AND/OR METAL WORN AREAS BERTECH PANAMA S.A. (PA) 2025-08-07 US disclosed
EP-1715980-B1 BASE PAD POLISHING PAD AND MULTI-LAYER PAD COMPRISING THE SAME SKC CO LTD (KR) 2011-05-18 EP disclosed
US-7381121-B2 Base pad polishing pad and multi-layer pad comprising the same SKC CO., LTD. (KR) 2008-06-03 US disclosed
US-20070254564-A1 Base Pad Polishing Pad and Multi-Layer Pad Comprising the Same SKC CO., LTD. (KR) 2007-11-01 US disclosed
EP-1715980-A1 BASE PAD POLISHING PAD AND MULTI-LAYER PAD COMPRISING THE SAME SKC Co., Ltd. (KR) 2006-11-02 EP disclosed
US-4296219-A Bismide-ether compounds, compositions thereof, and method of producing same HITACHI, LTD. (JP) 1981-10-20 US disclosed
EP-0004592-A1 Bisimide-ether compounds, compositions containing these compounds, and a method for their production Hitachi, Ltd. (JP) 1979-10-17 EP disclosed
US-4107151-A FROM POLYISOCYANATE, CHAIN POLYOL, AROMATIC DIAMINE, POLYOL OR AMINO ALCOHOL WITH URETHANE BOND IHARA CHEMICAL COMPANY CO., LTD. (JP) 1978-08-15 US disclosed
US-4002584-A LONG CHAIN POLYOL, HALOGENATED AROMATIC DIAMINE, ONE-SHOT REACTION IHARA CHEMICAL KOGYO KABUSHIKI KAISHA (JA) 1977-01-11 US disclosed
US-3984373-A EPOXY RESINS, N,N*-UNSATURATED AMIC ACIDS HITACHI, LTD. (JA) 1976-10-05 US disclosed