⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL3063197 | 0.72 | — | — | |
| SCHEMBL1362076 | 0.66 | — | — | |
| SCHEMBL1277019 | 0.65 | — | — | |
| SCHEMBL6831981 | 0.64 | — | — | |
| SCHEMBL5702404 | 0.63 | — | — | |
| SCHEMBL140209 | 0.61 | — | — | |
| SCHEMBL29046222 | 0.61 | — | — | |
| Hydrochloric Acid SCHEMBL14876677 | 0.61 | — | — | |
| SCHEMBL6670191 | 0.59 | — | — | |
| SCHEMBL14980246 | 0.59 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-2895641-B1 | METHODS FOR IMPROVING CONTROL AND EFFICIENCY OF LAYER-BY-LAYER PROCESSES | EASTMAN CHEM CO (US) | 2020-03-11 | — | — | EP | disclosed |
| US-9387505-B2 | Methods, materials and apparatus for improving control and efficiency of layer-by-layer processes | EASTMAN CHEMICAL COMPANY (US) | 2016-07-12 | — | — | US | disclosed |
| US-9376586-B2 | Coating agents with good storage stability, and coatings produced therefrom with high scratch resistance and simultaneously good weathering resistance | BASF COATINGS GMBH (DE) | 2016-06-28 | — | — | US | disclosed |
| CN-104995235-A | Moisture curable organopolysiloxane composition | MOMENTIVE PERFORMANCE MAT INC | 2015-10-21 | — | — | CN | disclosed |
| US-20140079884-A1 | Methods, Materials and Apparatus for improving control and efficiency of layer-by-layer processes | Svaya Nanotechnologies, Inc (US) | 2014-03-20 | — | — | US | disclosed |
| EP-2501496-B1 | COATING AGENTS WITH GOOD STORAGE STABILITY, AND COATINGS PRODUCED THEREFROM WITH HIGH SCRATCH RESISTANCE AND SIMULTANEOUSLY GOOD WEATHERING RESISTANCE | BASF COATINGS GMBH (DE) | 2014-02-12 | — | — | EP | disclosed |
| US-20130190437-A1 | COATING AGENTS WITH GOOD STORAGE STABILITY, AND COATINGS PRODUCED THEREFROM WITH HIGH SCRATCH RESISTANCE AND SIMULTANEOUSLY GOOD WEATHERING RESISTANCE | BASF COATINGS GMBH (DE) | 2013-07-25 | — | — | US | disclosed |
| EP-2501496-A1 | COATING AGENTS WITH GOOD STORAGE STABILITY, AND COATINGS PRODUCED THEREFROM WITH HIGH SCRATCH RESISTANCE AND SIMULTANEOUSLY GOOD WEATHERING RESISTANCE | BASF Coatings GmbH (DE) | 2012-09-26 | — | — | EP | disclosed |
| WO-2011060858-A1 | COATING AGENTS WITH GOOD STORAGE STABILITY, AND COATINGS PRODUCED THEREFROM WITH HIGH SCRATCH RESISTANCE AND SIMULTANEOUSLY GOOD WEATHERING RESISTANCE | BASF COATINGS GMBH (DE) | 2011-05-26 | — | — | WO | disclosed |
| EP-0592972-A2 | Resist coated metal- or semiconductor-substrate having a stable resist-substrate adhesion | INSTITUT FÜR MIKROTECHNIK MAINZ GmbH (DE) | 1994-04-20 | — | — | EP | disclosed |