SCHEMBL1809633

SCHEMBL1809633

CC(C)C(C)C(C)CC(C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL598504 0.87
SCHEMBL21898431 0.78
SCHEMBL14360162 0.77
SCHEMBL17607611 0.77
SCHEMBL4580220 0.75
SCHEMBL9360338 0.75
SCHEMBL24068448 0.73
SCHEMBL21074347 0.73
2,2,3-Trimethylbutane SCHEMBL11749069 0.71
SCHEMBL20763844 0.71

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 16 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20200171214-A1 BIORESORBABLE SURFACE COATING FOR DELAYING DEGRADATION DREI LILIEN PVG GMBH & CO. KG (DE) 2020-06-04 US disclosed
EP-3648806-A1 BIORESORBABLE SURFACE COATING FOR DELAYING DEGRADATION Drei Lilien PVG GmbH & Co. KG (DE) 2020-05-13 EP disclosed
CN-107108764-B The manufacturing method of high saturation nitrile rubber 日本瑞翁株式会社 2019-03-19 CN disclosed
WO-2019008192-A1 BIORESORBABLE SURFACE COATING FOR DELAYING DEGRADATION DREI LILIEN PVG GMBH & CO. KG (DE) 2019-01-10 WO disclosed
CN-107108764-A The manufacture method of high saturation nitrile rubber 日本瑞翁株式会社 2017-08-29 CN disclosed
US-20130244984-A1 Ceramide Production Promoter KAO CORPORATION (JP) 2013-09-19 US disclosed
US-8440645-B2 Ceramide production promoter KAO CORPORATION (JP) 2013-05-14 US disclosed
US-20110105439-A1 Ceramide Production Promoter KAO CORPORATION (JP) 2011-05-05 US disclosed
US-20090176095-A1 Novel triphenylmethane derivative, organic gellant containing the same, organic gel, and organic fiber MITSUBISHI GAS CHEMICAL CO., INC. (JP) 2009-07-09 US disclosed
EP-1707561-A1 NOVEL TRIPHENYLMETHANE DERIVATIVE, ORGANIC GELLANT CONTAINING THE SAME, ORGANIC GEL, AND ORGANIC FIBER MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2006-10-04 EP disclosed
US-6783755-B2 FOR USE AS ANTIPERSPIRANTS; COSMETICS KAO CORPORATION (JP) 2004-08-31 US disclosed
US-20030232026-A1 Topical compositions KAO CORPORATION (JP) 2003-12-18 US disclosed
US-5872272-A POLYDIMETHYLSILOXANES WITH PHOSPHATE SALTS KAO CORPORATION (JP) 1999-02-16 US disclosed
EP-0675891-B1 POLYVALENT METAL SALTS OF PHOSPHORIC DIESTER AND ORGANO(POLY)SILOXANES MODIFIED WITH POLYVALENT METAL SALT OF PHOSPHORIC DIESTER KAO CORP (JP) 1997-03-12 EP disclosed
EP-0675891-A1 POLYVALENT METAL SALTS OF PHOSPHORIC DIESTER AND ORGANO(POLY)SILOXANES MODIFIED WITH POLYVALENT METAL SALT OF PHOSPHORIC DIESTER. KAO CORP (JP) 1995-10-11 EP disclosed
WO-1994014822-A1 POLYVALENT METAL SALTS OF PHOSPHORIC DIESTER AND ORGANO(POLY)SILOXANES MODIFIED WITH POLYVALENT METAL SALT OF PHOSPHORIC DIESTER KAO CORPORATION (JP) 1994-07-07 WO disclosed