SCHEMBL181476

SCHEMBL181476

OC(F)(F)C(F)C(F)F

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28561464 0.87
SCHEMBL129262 0.79
SCHEMBL3624572 0.76
SCHEMBL3011769 0.76
SCHEMBL29281748 0.76
SCHEMBL28815631 0.74
SCHEMBL23824918 0.74
SCHEMBL7137089 0.74
SCHEMBL23825026 0.74
SCHEMBL23824939 0.74

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1582 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-122011327-A Modified bio-based polyol used for closed type soft high-solid-content polyurethane resin and preparation method thereof 浙江禾欣科技有限公司 2026-05-12 CN claimed
CN-122011015-A Electrolyte additive for flame retardance and application thereof 西安热工研究院有限公司 2026-05-12 CN claimed
CN-122010698-A Preparation method of perfluoromethoxy methylene vinyl ether 漳平市九鼎泰天科技有限公司 2026-05-12 CN claimed
US-20260100337-A1 PLASMA ETCHING METHOD AJOUUNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION (KR) 2026-04-09 US claimed
EP-3045586-B1 SHOE PRESS BELT AND METHOD OF MANUFACTURING THE SAME ICHIKAWA CO LTD (JP) 2025-12-10 EP claimed
US-12334359-B2 Plasma etching method Ajou University Industry—Academic Cooperation Foundation (KR) 2025-06-17 US claimed
US-20250179110-A1 IMPROVED OLIGONUCLEOTIDE SYNTHESIS BACHEM HOLDING AG (CH) 2025-06-05 US claimed
CN-119954644-A Method for producing succinic acid ester by maleic anhydride 上海师范大学 2025-05-09 CN claimed
CN-118725483-B Wear-resistant and corrosion-resistant polyvinyl chloride cable material 双登电缆股份有限公司 2025-05-02 CN claimed
US-12278093-B2 Plasma etching method using pentafluoropropanol AJOU UNIVERSITY INDUSTRY-ACADEMIC COOPERATION FOUNDATION (KR) 2025-04-15 US claimed
EP-0389087-A2 Washing agent and method MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1990-09-26 EP claimed
EP-0386346-A1 Solvent composition for cleaning silicon wafers PCR GROUP, INC. (US) 1990-09-12 EP claimed
EP-0367583-A2 Fluorinated, acrylamide-functional monomers MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1990-05-09 EP claimed
EP-0367582-A1 O-hydroxyalkylation of 1,1-dihydroperfluorinated alcohols MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1990-05-09 EP claimed
US-4906792-A O-hydroxyalkylation of 1,1-dihydroperfluorinated alcohols MINNESOTA MINING AND MANUFACTURING COMPANY (US) 1990-03-06 US claimed
EP-0300661-A2 Reflection-preventive pellicle film and process for preparation thereof MITSUI PETROCHEMICAL INDUSTRIES, LTD. (JP) 1989-01-25 EP claimed
EP-0131058-B1 OPTICAL FIBER ASSEMBLY AND PROCESS FOR PREPARING SAME MITSUBISHI RAYON CO., LTD. (JP) 1988-01-27 EP claimed
US-4547040-A Optical fiber assembly and process for preparing same MITSUBISHI RAYON CO., LTD. (JP) 1985-10-15 US claimed
EP-0131058-A1 Optical fiber assembly and process for preparing same MITSUBISHI RAYON CO., LTD. (JP) 1985-01-16 EP claimed
US-4393183-A STORAGE STABILITY, BONDING STRENGTH TOAGOSEI CHEMICAL INDUSTRY CO., LTD. (JP) 1983-07-12 US claimed