Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ESR2 | Q92731 | 3/20 | 1.00 |
| ▸ | MEN1 | O00255 | 2/20 | 1.00 |
| ▸ | KMT2A | Q03164 | 2/20 | 1.00 |
| ▸ | ESR1 | P03372 | 2/20 | 1.00 |
| ▸ | LTA4H | P09960 | 6/20 | 0.78 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.78 |
| ▸ | BAX | Q07812 | 1/20 | 0.78 |
| ▸ | PARP10 | Q53GL7 | 1/20 | 0.61 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.57 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.57 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.57 |
| ▸ | NPC1 | O15118 | 1/20 | 0.57 |
| ▸ | CA12 | O43570 | 1/20 | 0.57 |
| ▸ | GMNN | O75496 | 1/20 | 0.57 |
| ▸ | CA1 | P00915 | 1/20 | 0.57 |
| ▸ | CA2 | P00918 | 1/20 | 0.57 |
| ▸ | LMNA | P02545 | 1/20 | 0.57 |
| ▸ | CA3 | P07451 | 1/20 | 0.57 |
| ▸ | MAPT | P10636 | 1/20 | 0.57 |
| ▸ | TYR | P14679 | 1/20 | 0.57 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL249169 | 1.00 | ESR2 (1.00) | ESR2MEN1KMT2AESR1LTA4H | |
| SCHEMBL7811939 | 1.00 | ESR2 (1.00) | ESR2MEN1KMT2AESR1LTA4H | |
| SCHEMBL3175106 | 1.00 | ESR2 (1.00) | ESR2MEN1KMT2AESR1LTA4H | |
| Water SCHEMBL8862151 | 0.97 | MEN1 (0.93) | ESR2MEN1KMT2AESR1LTA4H | |
| Hydrogen Sulfide SCHEMBL27529439 | 0.97 | MEN1 (0.93) | ESR2MEN1KMT2AESR1LTA4H | |
| Bromide SCHEMBL11037542 | 0.94 | MEN1 (0.88) | ESR2MEN1KMT2AESR1LTA4H | |
| SCHEMBL2196668 | 0.91 | ESR2 (0.82) | ESR2MEN1KMT2AESR1LTA4H | |
| SCHEMBL14148732 | 0.91 | ESR2 (0.82) | ESR2MEN1KMT2AESR1LTA4H | |
| SCHEMBL9581090 | 0.91 | ESR2 (0.82) | ESR2MEN1KMT2AESR1LTA4H | |
| SCHEMBL21495883 | 0.91 | ESR2 (0.82) | ESR2MEN1KMT2AESR1LTA4H |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 32119 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4747302-A2 | REPAIR AND OPTIMIZATION OF NANOCOMPOSITE MATERIALS | Nanocore ApS (DK) | 2026-05-27 | — | — | EP | claimed |
| CN-116323801-B | Polycarbonate composite composition and preparation method thereof | LG CHEM, LTD. (KR) | 2026-05-26 | — | — | CN | claimed |
| CN-121021868-B | Natural polymer substance dissolving treatment method and application thereof | CHONGQING THREE GORGES UNIVERSITY (CN) | 2026-05-26 | — | — | CN | claimed |
| US-12630666-B2 | Urethane resin composition, foamed urethane sheet, and synthetic leather | DIC CORPORATION (JP) | 2026-05-19 | — | — | US | claimed |
| CN-122037164-A | Polyaryletherketone sequence copolymer, preparation method thereof and application thereof in 3D printing | 吉林大学 | 2026-05-15 | — | — | CN | claimed |
| CN-122037165-A | Fine synthesis method of high-performance polyaryletherketone | 徐州工业职业技术学院 | 2026-05-15 | — | — | CN | claimed |
| US-20260132270-A1 | FLUORORUBBER COMPOSITION AND MOLDED ARTICLE | DAIKIN INDUSTRIES, LTD. (JP) | 2026-05-14 | — | — | US | claimed |
| CN-115981100-B | Hydrofluoric acid-resistant protective material for lithography and lithography process thereof | 湖南梵鑫新材料股份有限公司 | 2026-05-12 | — | — | CN | claimed |
| CN-122011362-A | Polyaryletherketone copolymer with high Tg and low Tm, preparation method thereof and composite material | 江苏君华特种高分子材料股份有限公司 | 2026-05-12 | — | — | CN | claimed |
| EP-4194510-B1 | POLYCARBONATE COMPOUND COMPOSITION AND METHOD FOR PREPARING SAME | LG CHEMICAL LTD (KR) | 2026-04-29 | — | — | EP | claimed |
| US-4013727-A | OXIDATION OF PHENYL ETHERS WITH HYDROGEN PEROXIDE | UBE INDUSTRIES, LTD. (JA) | 1977-03-22 | — | — | US | claimed |
| US-4009039-A | Heat developable light-sensitive oxazoline containing element | FUJI PHOTO FILM CO., LTD. (JA) | 1977-02-22 | — | — | US | claimed |
| US-4003749-A | Heat-developable light-sensitive materials using the reaction product of a organic silver salt an a N-halo-oxazolidinone | FUJI PHOTO FILM CO., LTD. (JA) | 1977-01-18 | — | — | US | claimed |
| US-4002479-A | ORGANIC SILVER SALT, SILVER HALIDE, AND A REDUCING AGENT | FUJI PHOTO FILM CO., LTD. (JA) | 1977-01-11 | — | — | US | claimed |
| US-3997346-A | Method for stabilizing the image of a thermally developable photosensitive material | FUJI PHOTO FILM CO., LTD. (JA) | 1976-12-14 | — | — | US | claimed |
| US-3976606-A | Adhesives tackified with low molecular weight terpene-phenolic resins | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1976-08-24 | — | — | US | claimed |
| US-3966785-A | Process for the preparation of bisphenol bischlorocarbonic acid esters | BAYER AKTIENGESELLSCHAFT (DT) | 1976-06-29 | — | — | US | claimed |
| US-3951914-A | Process for preparing poly(1,4-benzamide) in cyclic sulfone media | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1976-04-20 | — | — | US | claimed |
| US-3945969-A | Continuous production of polycarbonates | BASF AKTIENGESELLSCHAFT (DT) | 1976-03-23 | — | — | US | claimed |
| US-3940430-A | AMINOALKYL | SCHWARZ SERVICES INTERNATIONAL LTD. (US) | 1976-02-24 | — | — | US | claimed |